Microwave Oven With Removable Storage Cassette in Dashboard of Motor Vehicle
A microwave oven adapted for use within a motor vehicle dashboard area. The microwave oven has a removable storage cassette, and slidable platforms for securing and serving containers of beverages and foods.
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| Number | Title | Issue Date |
| 7390366 | Apparatus for chemical vapor deposition An apparatus for CVD is disclosed. Processing gas is injected to an upper center portion of a wafer supporting member by a gas focus ring installed at an inner side surface of a reaction chamber. The processing gas is prevented from coming down to a lower space of t... | 06/24/2008 |
| 7104476 | Multi-sectored flat board type showerhead used in CVD apparatus Disclosed is a showerhead of a CVD apparatus comprising a plate having an empty inside and provided with a plurality of injection holes at one surface thereof; and gas supplying pipes installed at the plate so as to supply gas, wherein introduced gas thereto is inje... | 09/12/2006 |
| 7074461 | Method for fabricating hydrogenated silicon oxycarbide thin film A hydrogenated SiOC thin film fabrication method includes supplying bis-trimethylsilylmethane and oxygen retaining gas to a wafer installed inside a reaction channel through one supply pipe, simultaneously or sequentially supplying hydrogen to the wafer through anot... | 07/11/2006 |
| 7018505 | Apparatus including chuck and matching box An apparatus of fabricating a semiconductor device includes: a chamber; a radio frequency (RF) power supply supplying an RF power for the chamber; a matching box including a matching unit adjusting an impedance of the RF power; and a chuck penetrating a surface of t... | 03/28/2006 |
| 6917508 | Apparatus for manufacturing semiconductor device An apparatus for manufacturing a semiconductor device includes a chamber, upper and lower electrodes spacing apart and facing each other in the chamber, the upper and lower electrodes supplied with high frequency power to form plasma, an electrostatic chuck on the l... | 07/12/2005 |
| 6887794 | Pre-cleaning method of substrate for semiconductor device A pre-cleaning method of a substrate for a semiconductor device includes preparing a chamber, the chamber including a plasma electrode at an outside of the chamber, a power supplying system connected to the plasma electrode, a susceptor in the chamber, and an inject... | 05/03/2005 |
| 6884319 | Susceptor of apparatus for manufacturing semiconductor device A susceptor of an apparatus for manufacturing a semiconductor device includes a first part having a first lift pin hole, a second part combined with the first part and forming a space with the first part, wherein the second part has a second lift pin hole correspond... | 04/26/2005 |
| 6866745 | Semiconductor manufacturing apparatus The present invention provides an observation device installed in a chamber that is used for manufacturing semiconductor devices. The observation device includes at least two light-emission sources located at a chamber wall of the chamber, an electric power supplier... | 03/15/2005 |
| 6857388 | Cold wall chemical vapor deposition apparatus with a heater control unit A cold wall chemical vapor deposition apparatus includes: a chamber; a susceptor movable up and down in the chamber by a driving means, the susceptor including a heater and an internal electrode; a heat reflector over the susceptor, the heat reflector reflecting a h... | 02/22/2005 |
| 6847516 | Electrostatic chuck for preventing an arc An electrostatic chuck includes: a metal plate; a dielectric layer on the metal plate, the dielectric layer and the metal plate having a lift pin hole and an injection hole of a cooling gas; a lift pin moving up-and-down through the lift pin hole; first protection i... | 01/25/2005 |
| 6845732 | Gas heating apparatus for chemical vapor deposition process and semiconductor device fabrication method using same The present invention provides a gas heating apparatus that activates reaction gases for a chemical vapor deposition. The gas heating apparatus includes a chamber becoming enclosures of the gas heating apparatus; a heat insulating material 20 formed on an inn... | 01/25/2005 |
| 6772710 | Plasma enhanced chemical vapor deposition apparatus In a PECVD (plasma enhanced chemical vapor deposition) apparatus including a reaction chamber; plural susceptors installed inside the reaction chamber and horizontally mounted with a wafer respectively; a heating means for heating the susceptors; a power supply unit... | 08/10/2004 |
| 6770836 | Impedance matching circuit for inductively coupled plasma source An impedance matching circuit for a plasma source includes: a first network including: a first coil; and a RF power supply applying a first voltage to the first coil; and a second network including; a second coil grounded having a second voltage, the second voltage ... | 08/03/2004 |
| 6768269 | Plasma process chamber monitoring method and system used therefor A plasma process chamber is monitored for excess current while fabricating a semiconductor device. The method includes grounding the plasma process chamber in which fabricating a semiconductor device is conducted using a plasma; detecting a current flowing in a grou... | 07/27/2004 |
| 6723595 | Thin film deposition method including using atomic layer deposition without purging between introducing the gaseous reactants The present invention discloses a method of fabricating a thin film in a chamber where a heater and a suscepter are located. The method includes the steps of disposing an object on the susceptor so as to form the thin film thereon; heating the object; a first sub-st... | 04/20/2004 |
| 6688923 | Power-interface assembly of susceptor for use in semiconductor fabrication apparatus The present invention provides a susceptor power-interface assembly which is used for a chamber process module that includes a power supply, a process chamber and a susceptor, wherein the susceptor includes a susceptor shaft penetrating a bottom of the pr... | 02/10/2004 |
| 6685800 | Apparatus for generating inductively coupled plasma Disclosed is an apparatus for generating ICP, which has a heater having a hot wire as a heating source for heating elements in a chamber and inner wall of the chamber and also efficiently transfers heat of the heater through a heat transferring gas to the... | 02/03/2004 |
| 6565655 | High vacuum apparatus for fabricating semiconductor device and method for forming epitaxial layer using the same A high vacuum apparatus for fabricating a semiconductor device includes a reactive chamber provided with an inlet and an outlet for a reactive gas, a suscepter installed in the reactive chamber for mounting the semiconductor thereon and a vacuum pump conn... | 05/20/2003 |
| 6530993 | Cluster tool for fabricating semiconductor device A cluster tool for fabricating a semiconductor device includes: a transfer chamber having a wafer handling robot; a plurality of process chambers installed adjacent to each wall face of the transfer chamber; a loadlock chamber installed adjacent to differ... | 03/11/2003 |
| 6524430 | Apparatus for fabricating a semiconductor device An apparatus for fabricating a semiconductor device comprising: a reactor for providing a reaction region separated from outside; a pedestal arranged within said reactor to support a semiconductor substrate; a substrate transport port for loading said sem... | 02/25/2003 |
| 6514837 | High density plasma chemical vapor deposition apparatus and gap filling method using the same A high density plasma chemical vapor deposition apparatus includes a vacuum chamber provided with an inlet and an outlet for a reaction gas; a suscepter positioned within the vacuum chamber to mount a wafer thereon, the suscepter having a wafer chuck at i... | 02/04/2003 |
| 6435197 | Method of cleaning a semiconductor fabricating apparatus An apparatus for fabricating a semiconductor device includes: a reactive chamber having an inlet and an outlet for a gas and being electrically grounded; a susceptor installed in the reactive chamber for mounting a wafer thereon and being electrically ins... | 08/20/2002 |
| 6383953 | Apparatus for fabricating semiconductor device and method for fabricating semiconductor using the same An apparatus for fabricating a semiconductor device includes: a plasma torch having a hollow convey tube of which one end portion is made of a conductor so as to serve as an inner electrode, for injecting plasma generating gas through one end portion, con... | 05/07/2002 |
| 6338995 | High-permittivity dielectric capacitor for a semiconductor device and method for fabricating the same A high-permittivity dielectric capacitor and a fabrication method thereof are provided. The capacitor uses a tantalum oxynitride film as a high-permittivity dielectric film. The tantalum oxynitride film is deposited by chemical vapor deposition using tant... | 01/15/2002 |