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Assignee: JSR Corporation


Location: Tokyo, JP
No. of patents: 615

1                      
NumberTitleIssue Date
8182977Polymer and positive-tone radiation-sensitive resin composition
A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R
05/22/2012
8178641Amino group-containing conjugated diene polymer and method for producing the same, and block copolymer and method for producing the same
A method for producing an amino group-containing conjugated diene polymer includes polymerizing a conjugated diene compound in the presence of a reaction product of 1,3-bis(diphenylethenyl)benzene or a derivative thereof and an organolithium compound to obtain a con...
05/15/2012
8178626Method for producing modified conjugated diene based (co)polymer, modified conjugated diene based (co)polymer, and rubber composition
The method for producing a modified conjugated diene based (co)polymer, according to the present invention comprises a step of reacting a conjugated diene based (co)polymer with a metal halide compound to obtain a modified conjugated diene based (co)polymer, the con...
05/15/2012
8178279Negative radiation-sensitive resin composition
A negative-tone radiation-sensitive resin composition includes an alkali-soluble resin, a radically polymerizable compound, a radiation-sensitive radical initiator, and an organic solvent. The alkali-soluble resin includes a phenolic hydroxyl group. The radically po...
05/15/2012
8173351Compound and radiation-sensitive composition
A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute patt...
05/08/2012
8173348Method of forming pattern and composition for forming of organic thin-film for use therein
A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a bas...
05/08/2012
8157877Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion
A chemical mechanical polishing aqueous dispersion includes (A) abrasive grains having a pore volume of 0.14 ml/g or more, and (B) a dispersion medium. ...
04/17/2012
8153723Process for producing conjugated diene polymer, conjugated diene polymer, and rubber composition
A process for simply and inexpensively producing a conjugated diene polymer with a narrow molecular weight distribution and a high cis-bond content at a low cost is provided. The process comprises a polymerization step, wherein a conjugated diene polymer having a ci...
04/10/2012
8128464Chemical mechanical polishing pad
A chemical mechanical polishing pad used for chemical mechanical polishing comprises a polishing surface, a non-polishing surface that is provided opposite to the polishing surface, a side surface that connects an outer edge of the polishing surface and an outer edg...
03/06/2012
8124885Anisotropically conductive connector and anisotropically conductive connector device
An anisotropically conductive connector and an anisotropically conductive connector device. The anisotropically conductive connector includes a supporting member, a plurality of through-holes each extending in a thickness-wise direction of the supporting member, and...
02/28/2012
8124314Radiation-sensitive composition
A radiation-sensitive composition includes (A) a first polymer which becomes alkali-soluble by the action of an acid and does not contain a fluorine atom, (B) a second polymer having a repeating unit (b1) shown by the following formula (1) and a fluorine-containing ...
02/28/2012
8119517Chemical mechanical polishing method and method of manufacturing semiconductor device
A chemical mechanical polishing method comprises polishing an organic film using a slurry including polymer particles having a surface functional group and a water-soluble polymer. ...
02/21/2012
8119324Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film
A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the following order: (1) a step of forming and curing a under-layer film ...
02/21/2012
8110306Binder composition for secondary battery electrode, slurry for secondary battery electrode, and secondary battery electrode
There is provided a binder composition for secondary battery electrode, containing (A) a sulfonic acid group-containing polymer, and (B) an organic solvent composed mainly of N-methylpyrrolidone, wherein ...
02/07/2012
8101671Polyolefin resin foam and the process for producing the same
An object of the invention is to provide a polyolefin resin foam which is excellent in flexibility, cushioning property and processability, especially excellent in cutting processability. The present invention relates to a polyolefin resin foam obtained by foaming a...
01/24/2012
8097745Method of producing organosilicon compound
A simple method of producing an organosilicon compound of a formula R2n(OR4)mSi—R1—Si(OR4)mR2n is disclosed. The method comprises the following two steps,
01/17/2012
8093419Method of producing organosilicon compound
A method of producing an organosilicon compound includes substituting at least an OR1 group of a compound shown by the following general formula (1) to obtain a compound shown by the following general formula (2), Si(OR1)3-m
01/10/2012
8084563Cyclic olefin addition copolymer, process for production thereof, and retardation film obtained from the copolymer
A cyclic olefin addition copolymer includes a structural unit (1) derived from a cyclic olefin compound with a C4 alkyl substituent group and a structural unit (2) derived from a cyclic olefin compound with a C5-12 alkyl substituent group, and optionally includes a ...
12/27/2011
8084188Radiation-sensitive resin composition
A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes...
12/27/2011
8076053Upper layer-forming composition and photoresist patterning method
An upper layer-forming composition formed on a photoresist while causing almost no intermixing with the photoresist film and a photoresist patterning method are provided. The upper layer-forming composition is stably maintained without being eluted in a medium such ...
12/13/2011
8075882Adoptive immune cells for tumor vaccines
Adoptive immune cells obtained by a method including (a) obtaining mammalian antigen-presenting associated cells; (b) culturing the resulting cells from step (a) in a culture liquid contained in a culture vessel coated with a sugar chain-containing polymer; and (c) ...
12/13/2011
8058365Proton conducting membrane and process for producing the same
A proton conductive membrane displays sufficient proton conductivity even at low humidities and low temperatures. The proton conductive membrane includes: a block copolymer including an ion conductive polymer segment (A) and...
11/15/2011
8053521Chemical mechanical polishing pad
The present invention relates to polishing pads, including at least 60 to 99 parts by weight of a polymer matrix (A) having 1,2-polybutadiene; and 1 to 40 parts by weight of component (B) having a copolymer having a polyether block, where the total amount of the pol...
11/08/2011
8043786Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films...
10/25/2011
8043762Polyphenylene-containing electrode paste
The present invention provides an electrode paste which comprises catalyst particles, a solvent and an varnish which comprises a solvent and an electrode electrolyte for a solid polymer fuel cell electrolyte, wherein the electrode electrolyte comprises a polymer wit...
10/25/2011
8039165Proton conductive membrane comprising a copolymer
A proton conductive membrane capable of sufficient proton conductivity even at low humidities and low temperatures is provided. The proton conductive membrane includes a copolymer including an ion conductive polymer segment (A) and an ion nonconductive polymer segme...
10/18/2011
8026039Radiation-sensitive resin composition
A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin...
09/27/2011
8022129Conjugated diolefin copolymer rubber, method for producing the same, rubber composition and tire
A conjugated diolefin copolymer rubber is produced by copolymerization of a conjugated diolefin and an aromatic vinyl compound and has a primary amino group and an alkoxysilyl group bonded to the copolymer chain. The conjugated diolefin copolymer rubber contains the...
09/20/2011
8017700Polycarbosilane, method for producing same, silica composition for coating application, and silica film
A polycarbosilane has a main chain in which silicon atoms and carbon atoms are alternately repeated, and includes a structural unit shown by the following general formula (1), a structural unit shown by the following general formula (2), a structural unit shown by t...
09/13/2011
RE42593Photo-curable resin composition used for photo-fabrication of three-dimensional object
A photocurable resin composition suitable for photo-fabrication. The resin composition capable of being promptly cured by photo-irradiation, thereby reducing fabricating time and providing cured products having excellent mechanical strength and minimized shrinkage d...
08/02/2011
7981966Rubber composition
There is obtained a rubber composition excellent in processability of unvulcanized compounded rubber, excellent in wear resistance and wet skid resistance of vulcanized rubber, low in rolling resistance, and suitable for tire applications, particularly for tire trea...
07/19/2011
7981512Organic polymer-magnetic particles and process for producing same
Organic polymer particles having a structure shown by the following formula (1) are disclosed. wherein A represents an alkylidene group, an alkylene group, a cyclohexylene group, or a phenylene group, and B represents a lin...
07/19/2011
7977442Radiation-sensitive composition, polymer and monomer
A polymer includes a repeating unit shown by a general formula (1) in which R1 represents a hydrogen atom or a methyl group, R2 represents a substituted or unsubstituted linear or branched monovalent alkyl group having 1 to 20 carbon atoms, an ...
07/12/2011
7956142Polymerizable sulfonic acid onium salt and resin
A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. ...
06/07/2011
7932300Energy beam curable type ink jet printing ink
An energy beam curable type ink jet printing ink comprising (A) a colorant, (B) a compound having at least one ethylenically unsaturated bond which can be polymerized by the application of an energy beam and (C) a photopolymerization initiator, wherein ...
04/26/2011
7932295Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device
A method of forming an organic silica-based film, including: applying a composition for forming an insulating film for a semiconductor device, which is cured by using heat and ultraviolet radiation, to a substrate to form a coating; heating the coating; and applying...
04/26/2011
7922783Polishing pad and production method thereof
There are provided a polishing pad which exhibits excellent polishing stability and excellent slurry retainability during polishing and even after dressing, can prevent a reduction in polishing rate effectively and is also excellent in an ability to flatten an subst...
04/12/2011
7922497Anisotropic conductive connector and inspection equipment of circuit device
An anisotropically conductive connector device and an inspection apparatus for circuit devices including the anisotropically conductive connector device. The anisotropically conductive connector device includes an elastic anisotropically conductive film, including p...
04/12/2011
7916992Dry film for optical waveguide and method for manufacturing optical waveguide by using the dry film
Provided is an optical waveguide manufacturing method that makes the thickness of a clad layer in the vicinity of a core portion uniform. A first lamination film is fabricated by forming a clad layer by forming a first curable resin layer for clad formation on a fir...
03/29/2011
7906608Nitrogenated aromatic compound, process for production of the same, polymer, and proton conductive membrane
A nitrogen-containing aromatic compound is represented by Formula (1). A polymer is obtained by polymerizing the compound. wherein X is an atom or a group selected from halogen atoms other than fluorine and —OSO2
03/15/2011
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