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"What can be more palpably absurd than the prospect held out of locomotives traveling twice as fast as stagecoaches?"
The Quarterly Review ; March edition, 1825
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| Number | Title | Issue Date |
| 7252582 | Optimized grooving structure for a CMP polishing pad A polishing pad for a chemical mechanical polishing has a body rotatable in a predetermined direction and having a working surface, the working surface being provided with grooves, the grooves being formed so that over the course of a single revolution of the pad sa... | 08/07/2007 |
| 7189156 | Stacked polyurethane polishing pad and method of producing the same A polishing pad has a sublayer; a top layer attached to the sublayer, the sublayer having a modulus of elasticity between 300 and 5000 psi and a compressibility of less than 30% at 73 psi, wherein the top pad has a modulus of elasticity which is greater than the mod... | 03/13/2007 |
