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Assignee: Inopla Inc.


Location: San Jose, CA
No. of patents: 5

NumberTitleIssue Date
7374471Apparatus and method for polishing semiconductor wafers using one or more pivotable load-and-unload cups
An apparatus and method for polishing objects, such as semiconductor wafers, utilizes one or more pivotable load-and-unload cups to transfer the objects to and/or from one or more object carriers to polish the objects. Each pivotable load-and-unload cup may be confi...
05/20/2008
7367866Apparatus and method for polishing semiconductor wafers using pivotable load/unload cups
An apparatus and method for polishing objects, such as semiconductor wafers, utilizes pivotable load/unload cups to transfer the objects to object carriers to polish the objects on at least one polishing surface. The pivoting axes of the pivotable load/unload cups a...
05/06/2008
7364496Polishing head for polishing semiconductor wafers
A polishing head and method for handling and polishing semiconductor wafers uses a base structure with at least one recess region and an outer flexible membrane that can conform to the at least one recess region to form at least one depression to hold a semiconducto...
04/29/2008
7238614Methods for fabricating one or more metal damascene structures in a semiconductor wafer
Methods for fabricating one or more metal (e.g., copper) damascene structures in a semiconductor wafer use at least three polishing steps to reduce erosion topography in the resulting metal damascene structures and/or increase throughput. The polishing steps may be ...
07/03/2007
7223153Apparatus and method for polishing semiconductor wafers using one or more polishing surfaces
An apparatus and method for polishing objects, such as semiconductor wafers, utilizes one or more polishing surfaces, multiple wafer carriers and at least one load-and-unload cup. The load-and-unload cup may be configured to move to and from the wafer carriers in a ...
05/29/2007
 
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