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Assignee: Inko Industrial Corporation


Location: Sunnyvale, CA
No. of patents: 4

NumberTitleIssue Date
5814381Pellicle assembly having a vented frame
A pellicle for isolating a photomask pattern from particulate contaminants. The pellicle includes a peripheral frame having at least one vent for the passage of a gaseous substance between the interior of the frame and the atmosphere outside of the frame....
09/29/1998
5741576Optical pellicle with controlled transmission peaks and anti-reflective coatings
An optical pellicle and method of forming an optical pellicle. The pellicle includes a membrane and an anti-reflective coating covering at least one of the membrane surfaces. The membrane has a wavelength transmission pattern with consecutive first and se...
04/21/1998
5529819Pellicle assembly with vent structure
A pellicle for isolating a photomask pattern from particulate contaminants. The pellicle includes a peripheral frame having at least one vent structure for the passage of a gaseous substance between the interior of the frame and the atmosphere outside of ...
06/25/1996
4697701Dust free storage container for a membrane assembly such as a pellicle and its method of use
A dust free container is disclosed herein for storing an optical membrane assembly such as a pellicle after the assembly is manufactured but before the latter is placed into use. The optical membrane assembly is one which includes a circumferential frame ...
10/06/1987
 
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