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Assignee: IUCF-HYU


Location: Seoul, KR
No. of patents: 4

NumberTitleIssue Date
8077126Display device and driving method thereof
In a pixel of a display device, a first transistor of which an second terminal is connected to a first terminal of a light emitting element supplies a driving current that corresponds to a voltage between a control terminal and the second terminal to the light emitt...
12/13/2011
8062547CMP slurry, preparation method thereof and method of polishing substrate using the same
A CMP slurry is provided comprising polishing particles, the polishing particle comprising organically modified colloidal silica. Also, a method of preparing a CMP slurry is provided, comprising the steps of: preparing polishing particles comprising organically modi...
11/22/2011
7470295Polishing slurry, method of producing same, and method of polishing substrate
Disclosed herein is a polishing slurry for chemical mechanical polishing. The polishing slurry comprises polishing particles, which have a particle size distribution including separated fine and large polishing particle peaks. The polishing slurry also comprises pol...
12/30/2008
7364600Slurry for CMP and method of polishing substrate using same
Disclosed herein is a polishing slurry and a method of producing the same. The polishing slurry has high selectivity in terms of a polishing speed of an oxide layer to that of a nitride layer used in CMP of an STI process which is essential to produce ultra highly i...
04/29/2008
 
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