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Assignee: Hynix Semiconductor Inc.


Location: Ichon-Shi, Kyungki-Do, KR
No. of patents: 6

NumberTitleIssue Date
7889574Semiconductor memory device employing clamp for preventing latch up
A semiconductor memory device employs a clamp for preventing latch up. For the purpose, the semiconductor memory device includes a precharging/equalizing unit for precharging and equalizing a pair of bit lines, and a control signal generating unit for producing a co...
02/15/2011
7638827Semiconductor memory device
A semiconductor memory device capable of preventing bridge formations in a peripheral circuit region includes: a cell region; a peripheral circuit region adjacent to the cell region; and a plurality of line patterns formed in the cell region and the peripheral circu...
12/29/2009
7616032Internal voltage initializing circuit for use in semiconductor memory device and driving method thereof
Provided are an internal voltage initializing circuit for use in a semiconductor memory and a driving method thereof, which are capable of preventing a back bias voltage from abnormally increasing due to a pumping operation of a VPP pump according to a change in a l...
11/10/2009
7616022Circuit and method for detecting skew of transistors in a semiconductor device
A circuit and method for easily detecting skew of a transistor within a semiconductor device are provided. The circuit for detecting the skew of the transistor includes a linear voltage generating unit for outputting a linear voltage by using a first supply voltage,...
11/10/2009
7595526Capacitor and method for fabricating the same
A method for manufacturing a capacitor in a semiconductor device for securing capacitance without a merging phenomenon during a MPS grain growth process. The manufacturing step begins with a preparation of a substrate. The interlayer dielectric (ILD) layer is formed...
09/29/2009
7553724Method for manufacturing code address memory cell by which a stack insulating film of an oxide film and a nitride film used as a dielectric film in a flash memory is used as a gate oxide film
The present invention relates to a method manufacturing a code address memory (CAM) cell. The present invention uses a dielectric film in which an oxide film and a nitride film between a floating gate and a control gate in a flash memory cell are stacked as a gate i...
06/30/2009
 
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