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| Number | Title | Issue Date |
| 8094924 | E-beam defect review system An apparatus comprises an imaging unit to image a wafer to be reviewed, wherein imaging unit is the modified SORIL column. The modified SORIL column includes a focusing sub-system to do micro-focusing due to a wafer surface topology, wherein the focusing sub-system ... | 01/10/2012 |
| 8094428 | Wafer grounding methodology An apparatus for increasing electric conductivity to a wafer substrate, when exposed to electron beam irradiation, is disclosed. More specifically, a methodology to breakdown the insulating layer on wafer backside is provided to significantly reduce the damage on th... | 01/10/2012 |
| 8092641 | System and method for removing organic residue from a charged particle beam system A system and method for removing an organic residue from a charged particle beam system includes a conduit that is coupled to the column and is for adding oxygen to the column. A heater is coupled to the column and is for increasing the temperature in the column. A ... | 01/10/2012 |
| 8089297 | Structure and method for determining a defect in integrated circuit manufacturing process The present invention discloses a structure and method for determining a defect in integrated circuit manufacturing process, wherein the structure comprises a plurality of normal active areas formed in a plurality of first arrays and a plurality of defective active ... | 01/03/2012 |
| 8063363 | Method and apparatus for charged particle beam inspection A method, apparatus and computer readable medium for charged particle beam inspection of a sample comprising at least one sampling region and at least one skip region is disclosed. The method, apparatus and computer readable medium comprise receiving an imaging reci... | 11/22/2011 |
| 8022609 | Thermal field emission cathode A thermal field emission cathode which is employed in an electron microscope, a critical dimension examine tool, an electron beam lithograph machine, an electron beam tester and other electron beam related systems as an electron source is disclosed. Embodiments disc... | 09/20/2011 |
| 8010307 | In-line overlay measurement using charged particle beam system A method and system for controlling an overlay shift on an integrated circuit is disclosed. The method and system comprises utilizing a scanning electron microscope (SEM) to measure the overlay shift between a first mask and a second mask of the circuit after a seco... | 08/30/2011 |
| 7960697 | Electron beam apparatus The present invention relates to a charged particle beam apparatus which employs a scanning electron microscope for sample inspection and defect review. The present invent provides solution of improving imaging resolution by utilizing a field emission cathode... | 06/14/2011 |
| 7928383 | Charged particle system including segmented detection elements A charged particle detector consists of a plurality independent light guide modules assembled together to form a segmented in-lens on-axis annular detector, with a center hole for allowing the primary charged particle beam to pass through. One side of the assembly f... | 04/19/2011 |
| 7919760 | Operation stage for wafer edge inspection and review The present invention relates to an operation stage of a charged particle beam apparatus which is employed in a scanning electron microscope for substrate (wafer) edge and backside defect inspection or defect review. However, it would be recognized that the inventio... | 04/05/2011 |
| 7893406 | Electron gun with magnetic immersion double condenser lenses An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. I... | 02/22/2011 |
| 7825386 | System and method for a charged particle beam System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at le... | 11/02/2010 |
| 7767982 | Optical auto focusing system and method for electron beam inspection tool A method and system for inspecting a semiconductor wafer. The method includes providing an illumination flux through a pattern plate and a lens to a surface of a specimen to project a pattern onto the surface of the specimen. The pattern is associated with the patte... | 08/03/2010 |
| 7335879 | System and method for sample charge control A system and method for characterizing and charging a sample. The system includes a vacuum chamber, a first apparatus in the vacuum chamber and configured to characterize a sample, and a second apparatus in the vacuum chamber and configured to charge the sample. The... | 02/26/2008 |
| 7294590 | System and method for removing charges with enhanced efficiency Method and apparatus for removing and neutralizing charges. The method includes loading a structure into a chamber. The structure includes a first surface and a plurality of charges away from the first surface. Additionally, the method includes supplying a first ion... | 11/13/2007 |
| 7105436 | Method for in-line monitoring of via/contact holes etch process based on test structures in semiconductor wafer manufacturing A method for in-line monitoring of via/contact etching process based on a test structure is described. The test structure is comprised of via/contact holes of different sizes and densities in a layout such that, for a certain process, the microloading or RIE lag ind... | 09/12/2006 |
| 6960766 | Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method A swinging objective retarding immersion lens system and method therefore which provide a low voltage electron beam with high beam current, relatively high spatial resolution, a relative large scan field, and high signal collection efficiency. The objective lens inc... | 11/01/2005 |
| 6881956 | Method and apparatus for scanning semiconductor wafers using a scanning electron microscope An apparatus and method for scanning the surface of a specimen is disclosed for defect inspection purposes. Scanning Electron Microscope (SEM) is used to scan the surface of a specimen. The scanning method employed by the SEM comprises the steps of: generating a par... | 04/19/2005 |
