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Assignee: Euv LLC


Location: SantaClara, CA
No. of patents: 3

NumberTitleIssue Date
7273289Vacuum compatible, high-speed, 2-D mirror tilt stage
A compact and vacuum compatible magnetic-coil driven tiltable stage that is equipped with a high efficiency reflective coating can be employed as a scanner in EUV applications. The drive electronics for the scanner is fully in situ programmable and rapidly switchabl...
09/25/2007
6253464Method for protection of lithographic components from particle contamination
A system that employs thermophoresis to protect lithographic surfaces from particle deposition and operates in an environment where the pressure is substantially constant and can be sub-atmospheric. The system (thermophoretic pellicle) comprises an enclos...
07/03/2001
6031598Extreme ultraviolet lithography machine
An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask...
02/29/2000
 
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