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Assignee: Eugene Technology Co., Ltd.


Location: KR
No. of patents: 1

NumberTitleIssue Date
7326438Method for depositing nitride film using chemical vapor deposition apparatus of single chamber type
The present invention relates to a method for depositing a nitride film using a chemical vapor deposition apparatus of single chamber type, and more particularly to a method for depositing a nitride film that is capable of depositing the nitride film in which an are...
02/05/2008
 
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