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Assignee: Etec Systems, Inc.


Location: Beaverton, OR
No. of patents: 5

NumberTitleIssue Date
5781346Magnification correction for small field scanning
Magnification correction for small field scanning of large blanks is provided by adding magnification adjusting elements (lenses) to a double pass Wynne-Dyson lens or other type of one-to-one projection lens. The magnification adjusting optical elements i...
07/14/1998
5757469Scanning lithography system haing double pass Wynne-Dyson optics
A small field scanning photolithography system has a double pass Wynne-Dyson optical system which provides an erect, non-reverted, unmagnified image. An optical path through the system passes from an object, reflects off an input reflector, passes through...
05/26/1998
5386221Laser pattern generation apparatus
An improved laser pattern generation apparatus. The improved pattern generation apparatus of the present invention uses a laser beam to expose a radiant sensitive film on the workpiece to print circuit patterns on a substrate. The laser beam is aligned us...
01/31/1995
5255051Small field scanner
A method and apparatus for printing arbitrarily large circuit patterns using small field optics. The use of small field imaging optics allows the use of high NA lens designs capable of printing smaller geometries than otherwise would be possible. The fiel...
10/19/1993
5227839Small field scanner
A method and apparatus for printing arbitrarily large circuit patterns using small field optics. The use of small field imaging optics allows the use of high NA lens designs capable of printing smaller geometries than otherwise would be possible. The fiel...
07/13/1993
 
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