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Assignee: Eclipse Ion Technology, Inc.


Location: Beverly, MA
No. of patents: 1

NumberTitleIssue Date
4836233Method and apparatus for venting vacuum processing equipment
Controlled, low-turbulence venting of a semiconductor processing vacuum chamber is provided by a venting system including sensing elements for sensing gas conditions, including pressure, in the chamber during venting, and vent rate control elements, inclu...
06/06/1989
 
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