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| Number | Title | Issue Date |
| 7453077 | EUV light source An EUV light source and method of operating same is disclosed which may comprise: an EUV plasma production chamber comprising a chamber wall comprising an exit opening for the passage of produced EUV light focused to a focus point; a first EUV exit sleeve comprising... | 11/18/2008 |
| 7449704 | EUV light source An EUV light source apparatus and method for producing EUV light, which includes a plasma generation chamber for generating EUV plasma; an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma; a target sample having refl... | 11/11/2008 |
| 7449703 | Method and apparatus for EUV plasma source target delivery target material handling An EUV target delivery system and method are disclosed which may comprise: a target material purification system connected to deliver liquid target material comprising: a first container and a second container in fluid contact with the target material reservoir; a f... | 11/11/2008 |
| 7439530 | LPP EUV light source drive laser system An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive la... | 10/21/2008 |
| 7433372 | Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications A beam mixer for increasing intensity symmetry along a selected axis of a beam (wherein the beam extends from a first edge to a second edge along the axis) is disclosed and may include a plurality of mirrors establishing a spatially inverting path. For the beam mixe... | 10/07/2008 |
| 7415056 | Confocal pulse stretcher A gas discharge laser system producing a laser output pulse and a method of operating such a system is disclosed which may comprise a pulse stretcher which may comprise a laser output pulse optical delay initiating optic directing a portion of the laser output pulse... | 08/19/2008 |
| 7411686 | Methods and apparatus for aligning an etalon with a photodiode array A method and apparatus are disclosed for measuring a characteristic, e.g. spectral bandwidth, of a light beam. The apparatus may comprise an etalon for generating an interference pattern having at least one light cone, an arrangement of detector elements, the arrang... | 08/12/2008 |
| 7411203 | EUV light source An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets a... | 08/12/2008 |
| 7405416 | Method and apparatus for EUV plasma source target delivery An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orif... | 07/29/2008 |
| 7402825 | LPP EUV drive laser input system A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser ent... | 07/22/2008 |
| 7394083 | Systems and methods for EUV light source metrology Systems and methods for EUV Light Source metrology are disclosed. In a first aspect, a system for measuring an EUV light source power output may include a photoelectron source material disposed along an EUV light pathway to expose the material and generate a quantit... | 07/01/2008 |
| 7388220 | EUV light source An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light... | 06/17/2008 |
| 7382815 | Laser spectral engineering for lithographic process An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum neede... | 06/03/2008 |
| RE40343 | Control circuit with automatic DC offset An automatic gain control circuit in the feedback path for a laser wavelength control circuit is described herein. This gain control circuit automatically adjusts the amplification of the analog signals output from a photodetector array, where the array detects a fr... | 05/27/2008 |
| 7378673 | Source material dispenser for EUV light source A source material dispenser for an EUV light source is disclosed that comprises a source material reservoir, e.g. tube, that has a wall and is formed with an orifice. The dispenser may comprise an electro-actuatable element, e.g. PZT material, that is spaced from th... | 05/27/2008 |
| 7372056 | LPP EUV plasma source material target delivery system An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing opt... | 05/13/2008 |
| 7369597 | Laser output light pulse stretcher Providing a high peak power short pulse duration gas discharge laser output pulse comprises a pulse stretcher a laser output pulse optical delay initiating optic diverting a portion of the output laser pulse into an optical delay having an optical delay path and com... | 05/06/2008 |
| 7369596 | Chamber for a high energy excimer laser source A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electri... | 05/06/2008 |
| 7368741 | Extreme ultraviolet light source The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line wit... | 05/06/2008 |
| 7365349 | EUV light source collector lifetime improvements An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plas... | 04/29/2008 |
| 7366219 | Line narrowing module A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive c... | 04/29/2008 |
| 7365351 | Systems for protecting internal components of a EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 04/29/2008 |
| 7361918 | High repetition rate laser produced plasma EUV light source An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interva... | 04/22/2008 |
| 7355191 | Systems and methods for cleaning a chamber window of an EUV light source Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation.... | 04/08/2008 |
| 7346093 | DUV light source optical element improvements A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mount... | 03/18/2008 |
| 7339973 | Electrodes for fluorine gas discharge lasers Fluorine gas discharge laser electrodes and electrode systems that may comprise a plurality of current return tangs extending for less than the respective length of the second elongated gas discharge electrode. In addition electrodes may comprise a first discharge s... | 03/04/2008 |
| 7323703 | EUV light source An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape ha... | 01/29/2008 |
| 7321607 | External optics and chamber support system A gas discharge laser and method of operating same is disclosed which may comprise a gas discharge laser chamber support structure comprising a first support arm attached to a mounting table; a gas discharge laser chamber slideably engaging the first support arm; an... | 01/22/2008 |
| 7317536 | Spectral bandwidth metrology for high repetition rate gas discharge lasers A bandwidth meter apparatus and method for measuring the bandwidth of a spectrum of light emitted from a laser input to the bandwidth meter which may comprise an optical bandwidth monitor providing a first output representative of a first parameter which is indicati... | 01/08/2008 |
| 7317196 | LPP EUV light source An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target wi... | 01/08/2008 |
| 7317179 | Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective el... | 01/08/2008 |
| 7309871 | Collector for EUV light source An apparatus/method may comprise, a multi-layer reflecting coating forming an EUV reflective surface which may comprise an inter-diffusion barrier layer which may comprise a carbide selected from the group ZrC and NbC or a boride selected from the group ZrB2 | 12/18/2007 |
| 7304748 | Method and apparatus for bandwidth measurement and bandwidth parameter calculation for laser light A bandwidth meter method and apparatus for measuring the bandwidth of a spectrum of light emitted from a laser input to the bandwidth meter is disclosed, which may comprise an optical bandwidth monitor providing a first output representative of a first parameter whi... | 12/04/2007 |
| 7301980 | Halogen gas discharge laser electrodes A gas discharge laser includes a laser chamber containing a halogen laser gas, two electrode elements defining a cathode and an anode, each having a discharge receiving region defining two longitudinal edges and having a region width defining a width of an electric ... | 11/27/2007 |
| 7298770 | Laser spectral engineering for lithographic process An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum neede... | 11/20/2007 |
| 7295591 | Long-pulse pulse power system for gas discharge laser A long pulse pulse power system for gas discharge lasers. The system includes a sustainer capacitor for accepting a charge from a high voltage pulse power source. A peaking capacitor with a capacitance value of less than half the sustainer capacitance provides the h... | 11/13/2007 |
| 7292343 | Gas discharge MOPA laser spectral analysis module A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwid... | 11/06/2007 |
| 7291853 | Discharge produced plasma EUV light source An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members... | 11/06/2007 |
| 7288778 | Collector for EUV light source It will be understood that an apparatus and method is disclosed, which may comprise a multi-layer reflecting coating forming an EUV reflective surface which may comprise a spectral filter tuned to selectively highly reflect light in a band centered about at a first ... | 10/30/2007 |
| 7288777 | Collector for EUV light source An apparatus/method is disclosed that may comprise an EUV light source which may comprise a collector which may comprise an elliptical collector mirror having a first focus at a plasma initiation point and a second focus at an intermediate focus of the EUV light sou... | 10/30/2007 |
