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Assignee: Clariant Chimie S.A.


Location: Puteaux, FR
No. of patents: 2

NumberTitleIssue Date
6043159Chemical mechanical polishing process for layers of isolating materials based on silicon derivatives or silicon
Process for the chemical mechanical polishing of a layer of isolating material based on silicon or a silicon derivative, in which abrasion of the layer of isolating material is carried out by rubbing said layer using a fabric which brings into play an abr...
03/28/2000
5773632Process for the preparation of the enol lactone of 2-oxocyclohexlidene acetic acid and application to the preparation of 2-cuomaranone
A process for the preparation of the enol lactone of 2-oxocyclohexylidene acetic acid wherein (i) glyoxylic acid is allowed to react with cyclohexanone in the presence of a halogen acid in order to obtain a crude reaction product B1, then (ii) said crude react...
06/30/1998
 
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