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| Number | Title | Issue Date |
| 7289279 | Lithographic objective having a first lens group including only lenses having a positive refractive power A projection objective includes a first lens group (G1) of positive refractive power, a second lens group (G2) of negative refractive power and at least one further lens group of positive refractive power in which a diaphragm is mounted. The first lens... | 10/30/2007 |
| 7154678 | Projection objective having adjacently mounted aspheric lens surfaces A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a doubl... | 12/26/2006 |
| 7023627 | Lithographic objective having a first lens group including only lenses having a positive refractive power A projection objective includes a first lens group (G1) of positive refractive power, a second lens group (G2) of negative refractive power and at least one further lens group of positive refractive power in which a diaphragm is mounted. The first lens... | 04/04/2006 |
| 7006595 | Illumination system particularly for microlithography There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into... | 02/28/2006 |
| 6937394 | Device and method for changing the stress-induced birefringence and/or the thickness of an optical component A device serves the purpose of changing the stress-induced birefringence and/or the thickness (d and D, respectively) of an optical component by elastic deformation caused by means of stress. The optical component is gripped on a circumference, arranged at least app... | 08/30/2005 |
| 6864988 | Optical system with isolated measuring structure An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical sy... | 03/08/2005 |
| 6862137 | Method for adjusting a lamp relative to an illuminating beam path of a microscope and a microscope suitable for carrying out the method The invention relates to a method for automatic lamp adjustment in a microscope without beam homogenizers in the illuminating beam path and a microscope equipped for the application of the method. According to the invention, the light power in the illuminating beam ... | 03/01/2005 |
| 6809871 | Geometric beamsplitter and method for its fabrication A method for fabricating a geometric beamsplitter involves applying a reflective coating having at least one metallic layer to a transparent substrate. A pattern of holes containing numerous holes that are preferably randomly distributed over its reflective surface ... | 10/26/2004 |
| 6788387 | Lithographic objective having a first lens group including only lenses having a positive refractive power A projection objective includes a first lens group (G1) of positive refractive power, a second lens group (G2) of negative refractive power and at least one further lens group of positive refractive power in which a diaphragm is mounted. The first lens... | 09/07/2004 |
| 6788471 | Projection exposure apparatus for microlithography The invention relates to a projection exposure apparatus for microlithography at λ | 09/07/2004 |
| 6774984 | Optical imaging system with polarizer and a crystalline-quartz plate for use therewith An optical imaging system having several imaging optical components (L1-L16) sequentially arranged along an optical axis (16), a means for creating radially polarized light arranged at a given location in that region extending up to the last of ... | 08/10/2004 |
| 6744574 | Mount for an optical element in an optical imaging device A mount for an optical element in an optical imaging device, in particular in a lens system (4) for semiconductor lithography, has at least one mounting ring (2) which bears the optical element (6). The mounting ring (2) is of at least pa... | 06/01/2004 |
| 6733165 | Optical integrator for an illumination device An optical integrator for an illumination device of a microlithographic projection exposure system has a rod made of a material transparent for ultraviolet light and with a rectangular cross-section. A rod arrangement with, for example, seven small rods made of the ... | 05/11/2004 |
| 6734970 | Method and a device for determining the radiation-damage resistance of an optical material A method and a device for determining the resistance of an optical material to radiation damage, wherein several sample volumes (1a, 1b; 1211-1233) within the optical material are simultaneously irradia... | 05/11/2004 |
| 6733369 | Method and apparatus for polishing or lapping an aspherical surface of a work piece An apparatus for polishing or lapping an aspherical surface of a work piece comprises a tool rotatable about an axis, the working surface area of the tool being smaller than the work piece, and an arrangement by means of which the tool and the work piece are adjusta... | 05/11/2004 |
| 6728043 | Microlithographic illumination method and a projection lens for carrying out the method A microlithographic illumination method for imaging a pattern arranged in an object plane of a projection lens onto an image plane of the projection lens, under which a special means for optically correcting the optical path lengths of s-polarized and p-polarized li... | 04/27/2004 |
| 6717746 | Catadioptric reduction lens A catadioptric projection lens configured for imaging a pattern arranged in an object plane (2) onto an image plane (4) while creating a single, real, intermediate image (3) has a catadioptric first section (5) having a concave mirror ( | 04/06/2004 |
| 6646718 | Projection objective having adjacently mounted aspheric lens surfaces A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double a... | 11/11/2003 |
| 6611574 | Illumination system with reduced heat load An illumination system for wavelengths ࣘ193 run comprises (a) a first raster element upon which a light bundle emitted from a light source impinges, for producing a convergent light bundle having a focal point, and (b) a second raster element. The conve... | 08/26/2003 |
| 6594093 | Adjusting apparatus for an optical element in a lens system In the case of an adjusting apparatus for an optical element in a lens system, in particular a lens in a projection lens system for semiconductor lithography, for producing tilting movements, having at least one actuator, the optical element is connected ... | 07/15/2003 |
