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| Number | Title | Issue Date |
| 8174674 | Lithographic apparatus and device manufacturing method An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection ... | 05/08/2012 |
| 8102502 | Lithographic apparatus and device manufacturing method Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts ... | 01/24/2012 |
| 8094287 | Lithographic appararus and method A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The a... | 01/10/2012 |
| 7952685 | Illuminator for a lithographic apparatus and method An illuminator for a lithographic apparatus, the illuminator including an illumination mode defining element and a plurality of polarization modifiers, the polarization modifiers being moveable into or out of partial intersection with a radiation beam having an angu... | 05/31/2011 |
| 7911598 | Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device Components (30) in the interior of an EUV lithography device for extreme ultraviolet and soft X-ray wavelength range are cleaned by igniting a plasma, adjacent to the component (30) to be cleaned, using electrodes (29), wherein the electrodes ( | 03/22/2011 |
| 7907347 | Optical composite material and method for its production An optical composite material comprises an amorphous optical material (6) with a first refractive index (na), into which crystalline nanoparticles (7) having a second, higher refractive index (nn) are embedded, wherein the amorpho... | 03/15/2011 |
| 7884922 | Illumination system for microlithography An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from an assigned light source includes a pupil shaping unit for receiving light from the assigned light source and for generating a pred... | 02/08/2011 |
| 7880969 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongate... | 02/01/2011 |
| 7848031 | Hologram and method of manufacturing an optical element using a hologram A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer 1a directing measuring light (23a) onto the optical surface wherein the measuring ligh... | 12/07/2010 |
| 7848016 | High-NA projection objective A catadioptric projection objective for imaging a pattern provided in an object surface onto an image surface of the projection objective has an object-side imaging subsystem for creating a final intermediate image closest to the image surface from radiation coming ... | 12/07/2010 |
| 7847921 | Microlithographic exposure method as well as a projection exposure system for carrying out the method In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarizati... | 12/07/2010 |
| 7847920 | Illumination system and polarizer for a microlithographic projection exposure apparatus An illumination system for illuminating a reticle that moves along a scanning direction in a microlithographic projection exposure apparatus has an optical axis and an optical component producing an illumination angle distribution of the projection light. In accorda... | 12/07/2010 |
| 7875865 | EUV illumination system with a system for measuring fluctuations of the light source The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light sourc... | 01/25/2011 |
| 7875418 | Method for a multiple exposure, microlithography projection exposure installation and a projection system In a method for multiply exposing at least one substrate coated with a photosensitive layer, a first exposure is carried out in accordance with a first set of exposure parameters on a first projection system, and a second exposure is carried out in accordance with a... | 01/25/2011 |
| RE42065 | Illumination system particularly for microlithography There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component t... | 01/25/2011 |
| 7871171 | Focusing-device for the radiation from a light source A focusing-device for the radiation from a light source (2) is provided with a collector mirror (1, 1′) which is arranged in a mount (24) and collects the light, in virtual or real terms, from the light source (2) at the second focus ( | 01/18/2011 |
| 7869138 | Projection objective and projection exposure apparatus with negative back focus of the entry pupil The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image... | 01/11/2011 |
| 7869122 | Catadioptric projection objective A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first inte... | 01/11/2011 |
| 7859641 | Optical element module An optical element module comprising a plurality of module components is provided. The module components comprise an optical element, an optical element holder and a contact element. The optical element has a first coefficient of thermal expansion. The optical eleme... | 12/28/2010 |
| 7858957 | Illumination optics for projection microlithography Illumination optics that can be used, for example, for EUV projection microlithography are disclosed. Also disclosed are illumination systems provided with such illumination optics, projection exposure apparatuses provided with such illumination systems, related met... | 12/28/2010 |
| 7835073 | Projection objective for lithography In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least t... | 11/16/2010 |
| 7834981 | Projection exposure apparatus, projection exposure method and projection objective A projection exposure apparatus for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask that is arranged in the region of an object surface of the project... | 11/16/2010 |
| 7830611 | Projection objective of a microlithographic projection exposure apparatus A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optic... | 11/09/2010 |
| 7826155 | Vibration damping for photolithographic lens mount A connection between two components supported in a mutually vibrating fashion has at least one connection element connecting the two components, and a gap located between the two components in which a medium is located. The gap has a width small enough to largely pr... | 11/02/2010 |
| 7817250 | Microlithographic projection exposure apparatus The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illum... | 10/19/2010 |
| 7817248 | Optical imaging arrangement There is provided an optical imaging arrangement comprising: a mask unit comprising a pattern, a substrate unit comprising a substrate, an optical projection unit comprising a group of optical element units, the optical projection unit being adapted to transfer an i... | 10/19/2010 |
| 7816022 | Composite structure for microlithography and optical arrangement A composite structure for microlithography, in particular a holding device for a wafer, has two or more components, the surfaces of which are bonded together at least at one bond. At least one of the components consists of cordierite (Mg2Al4Si | 10/19/2010 |
| 7808615 | Projection exposure apparatus and method for operating the same The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in an image plane (8). The object (5)... | 10/05/2010 |
| 7800849 | Apparatus for mounting two or more elements and method for processing the surface of an optical element In an apparatus for mounting two or more optical elements that are each held in an individual mount or in a support structure, said optical elements are mounted in a common mount. The relative positioning of the optical elements (10, 11) in the common mount (... | 09/21/2010 |
| 7800732 | Projection exposure method and projection exposure apparatus for microlithography A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objecti... | 09/21/2010 |
| 7798676 | Filter device for the compensation of an asymmetric pupil illumination The invention relates to a filter device for an illumination system, especially for the correction of the illumination of the illuminating pupil, including a light source, with the illumination system being passed through by a bundle of illuminating rays from the li... | 09/21/2010 |
| 7796274 | System for measuring the image quality of an optical imaging system A measuring system (100) for the optical measurement of an optical imaging system (150), which is provided to image a pattern arranged in an object surface (155) of the imaging system in an image surface (156) of the imaging system, compr... | 09/14/2010 |
| RE41667 | Illumination system particularly for microlithography There is provided an illumination system for microlithography with wavelengths≦193 nm that includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary... | 09/14/2010 |
| 7791826 | Optical assembly An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element ... | 09/07/2010 |
| 7791811 | Lens blank and lens elements as well as method for their production A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), ... | 09/07/2010 |
| 7791737 | Method and apparatus for interferometrically measuring the shape of a test object Electromagnetic illumination radiation is produced and provided as an input wave. The input wave passes through a diffractive optical element and leaves as an incoming measuring wave, the wave front of the input wave being transformed such that the wave front of the... | 09/07/2010 |
| 7791711 | Projection method including pupillary filtering and a projection lens therefor Processes for producing semiconductor components and/or other finely structured components include providing a projection objective having a mirror that is located within a predetermined proximity to a pupil surface of a projection objective. In one variant, an imag... | 09/07/2010 |
| 7787177 | High-NA projection objective with aspheric lens surfaces A projection objective for imaging a pattern provided in an object surface onto an image surface of the projection objective has an object-side imaging subsystem for creating a final intermediate image closest to the image surface from radiation coming from the obje... | 08/31/2010 |
| 7787104 | Illumination optics for a microlithographic projection exposure apparatus Illumination optics for a microlithographic projection exposure apparatus is used for illumination of an object field in the object plane with illumination light of a radiation source. The illumination optics has an optical beam influencing element which is divided ... | 08/31/2010 |
| 7782538 | Projection objective having a high aperture and a planar end surface A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiat... | 08/24/2010 |
