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A hands free towel carrying system for coupling a towel to a user to prevent loss, theft or contamination.

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Assignee: Cabot Microelectronics Corp.

Location: Aurora, IL
No. of patents: 1

Number	Title	Issue Date
7438795	Electrochemical-mechanical polishing system Provided is a polishing apparatus and polishing pad, intended for polishing a substrate, and designed for improved flow and distribution of a polishing composition to the area of interaction between the pad and substrate. In one aspect, a polishing pad is provided h...	10/21/2008