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| Number | Title | Issue Date |
| 7707538 | Multivariable solver for optical proximity correction The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matri... | 04/27/2010 |
| 7703069 | Three-dimensional mask model for photolithography simulation A three-dimensional mask model of the invention provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a se... | 04/20/2010 |
| 7695876 | Method for identifying and using process window signature patterns for lithography process control A method for identifying process window signature patterns in a device area of a mask is disclosed. The signature patterns collectively provide a unique response to changes in a set of process condition parameters to the lithography process. The signature patterns e... | 04/13/2010 |
| 7694267 | Method for process window optimized optical proximity correction One embodiment of a method for process window optimized optical proximity correction includes applying optical proximity corrections to a design layout, simulating a lithography process using the post-OPC layout and models of the lithography process at a plurality o... | 04/06/2010 |
| 7617477 | Method for selecting and optimizing exposure tool using an individual mask error model Methods are disclosed for selecting and optimizing an exposure tool using an individual mask error model. In one embodiment, a method includes selecting a model of a lithography process including an optical model of an exposure tool and a resist model, creating an i... | 11/10/2009 |
| 7587704 | System and method for mask verification using an individual mask error model Methods and systems are disclosed to inspect a manufactured lithographic mask, to extract physical mask data from mask inspection data, to determine systematic mask error data based on differences between the physical mask data and mask layout data, to generate syst... | 09/08/2009 |
| 7564017 | System and method for characterizing aerial image quality in a lithography system While a high-resolution 2-dimensional image reconstruction is expected to give the maximum possible amount of information on the aerial image in a projection system, relevant information regarding image quality can be derived from a statistical evaluation of image v... | 07/21/2009 |
| 7558419 | System and method for detecting integrated circuit pattern defects There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for inspecting integrated circuits, including, for example, patterns projected, provided or formed on a wafer using photomasks,... | 07/07/2009 |
| 7488933 | Method for lithography model calibration A method for separately calibrating an optical model and a resist model of lithography process using information derived from in-situ aerial image measurements to improve the calibration of both the optical model and the resist model components of the lithography si... | 02/10/2009 |
| 7233874 | Method and apparatus for monitoring integrated circuit fabrication In one aspect, the present invention is a sensor unit for sensing process parameters of a process to manufacture an integrated circuit using integrated circuit processing equipment. In one embodiment, the sensor unit includes a substrate having a wafer-shaped profil... | 06/19/2007 |
| 7171334 | Method and apparatus for synchronizing data acquisition of a monitored IC fabrication process There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for autonomously monitoring fabrication equipment, for example, integrated circuit fabrication equipment. In one embodiment of ... | 01/30/2007 |
| 7120895 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 10/10/2006 |
| 7117478 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 10/03/2006 |
| 7117477 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 10/03/2006 |
| 7114145 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 09/26/2006 |
| 7111277 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 09/19/2006 |
| 7053355 | System and method for lithography process monitoring and control A system and sensor for measuring, inspecting, characterizing, evaluating and/or controlling optical lithographic equipment and/or materials used therewith, for example, photomasks. In one embodiment, the system and sensor measures, collects and/or detects an aerial... | 05/30/2006 |
| 7003758 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 02/21/2006 |
| 6969864 | System and method for lithography process monitoring and control A system and sensor for measuring, inspecting, characterizing, evaluating and/or controlling optical lithographic equipment and/or materials used therewith, for example, photomasks. In one embodiment, the system and sensor measures, collects and/or detects an aerial... | 11/29/2005 |
| 6969837 | System and method for lithography process monitoring and control A system and sensor for measuring, inspecting, characterizing, evaluating and/or controlling optical lithographic equipment and/or materials used therewith, for example, photomasks. In one embodiment, the system and sensor measures, collects and/or detects an aerial... | 11/29/2005 |
| 6959255 | Method and apparatus for monitoring integrated circuit fabrication In one aspect, the present invention is a sensor unit for sensing process parameters of a process to manufacture an integrated circuit using integrated circuit processing equipment. In one embodiment, the sensor unit includes a substrate having a wafer-shaped profil... | 10/25/2005 |
| 6906305 | System and method for aerial image sensing A system to sense an aerial image produced by optical equipment used in, for example, semiconductor fabrication. In one embodiment, the system includes a photo-electron emission device which, in response to an aerial image projected thereon, emits electrons in a pat... | 06/14/2005 |
| 6892156 | Method and apparatus for monitoring integrated circuit fabrication In one aspect, the present invention is a sensor unit for sensing process parameters of a process to manufacture an integrated circuit using integrated circuit processing equipment. In one embodiment, the sensor unit includes a substrate having a wafer-shaped profil... | 05/10/2005 |
| 6884984 | System and method for lithography process monitoring and control In one aspect, the present invention is a technique of, and a system and sensor for measuring, inspecting, characterizing and/or evaluating optical lithographic equipment, methods, and/or materials used therewith, for example, photomasks. In one embodiment, the syst... | 04/26/2005 |
| 6879924 | Method and apparatus for monitoring integrated circuit fabrication In one aspect, the present invention is a sensor unit for sensing process parameters of a process to manufacture an integrated circuit using integrated circuit processing equipment. In one embodiment, the sensor unit includes a substrate having a wafer-shaped profil... | 04/12/2005 |
| 6828542 | System and method for lithography process monitoring and control In one aspect, the present invention is a technique of, and a system and sensor for measuring, inspecting, characterizing and/or evaluating optical lithographic equipment, methods, and/or materials used therewith, for example, photomasks. In one embodiment of this a... | 12/07/2004 |
| 6820028 | Method and apparatus for monitoring integrated circuit fabrication In one aspect, the present invention is a sensor unit for sensing process parameters of a process to manufacture an integrated circuit using integrated circuit processing equipment. In one embodiment, the sensor unit includes a substrate having a wafer-shaped profil... | 11/16/2004 |
| 6806456 | System and method for lithography process monitoring and control In one aspect, the present invention is a technique of, and a system and sensor for measuring, inspecting, characterizing and/or evaluating optical lithographic equipment, methods, and/or materials used therewith, for example, photomasks. In one embodiment, the syst... | 10/19/2004 |
| 6807503 | Method and apparatus for monitoring integrated circuit fabrication In one aspect, the present invention is a sensor unit for sensing process parameters of a process to manufacture an integrated circuit using integrated circuit processing equipment. In one embodiment, the sensor unit includes a substrate having a wafer-shaped profil... | 10/19/2004 |
| 6803554 | System and method for lithography process monitoring and control In one aspect, the present invention is a technique of, and a system and sensor for measuring, inspecting, characterizing and/or evaluating optical lithographic equipment, methods, and/or materials used therewith, for example, photomasks. In one embodiment of this a... | 10/12/2004 |
