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Assignee: Beck Semiconductor LLC


Location: Las Vegas, NV
No. of patents: 3

NumberTitleIssue Date
7372152Copper interconnect systems
An integrated circuit (IC) may include a substrate, a first dielectric layer adjacent the substrate, and at least one trench in the first dielectric layer. The IC may also include a metal liner within the at least one trench, and a first conductive region including ...
05/13/2008
7361589Copper interconnect systems which use conductive, metal-based cap layers
An integrated circuit (IC) may include a substrate, a first dielectric layer adjacent the substrate, and at least one trench in the first dielectric layer. The IC may also include a metal liner within the at least one trench, and a first conductive region including ...
04/22/2008
7351655Copper interconnect systems which use conductive, metal-based cap layers
An integrated circuit (IC) may include a substrate, a first dielectric layer adjacent the substrate, and at least one trench in the first dielectric layer. The IC may also include a metal liner within the at least one trench, and a first conductive region including ...
04/01/2008
 
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