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| Number | Title | Issue Date |
| 8184266 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes an illumination system, a support, a substrate table, a projection system, and an actuator. The illumination system is configured to condition a radiation beam. The support is constructed to support a patterning device. The patterni... | 05/22/2012 |
| 8184265 | Correction method for non-uniform reticle heating in a lithographic apparatus A method that includes conditioning a radiation beam, imparting the radiation beam with a pattern to form a patterned radiation beam by a reticle having a pattern image area and a reticle mark, and projecting the patterned radiation beam onto a target portion of a s... | 05/22/2012 |
| 8182969 | Lithographic processing method, and device manufactured thereby A method of splitting a lithographic pattern into two sub-patterns, includes generating test structures corresponding to structures of interest in the lithographic pattern, varying the test structures through a selected range of dimensions, simulating an image of th... | 05/22/2012 |
| 8178263 | Method for a lithographic apparatus A method of increasing a depth of focus of a lithographic apparatus is disclosed. The method includes forming diffracted beams of radiation using a patterning device pattern; and transforming a phase-wavefront of a portion of the diffracted beams into a first phase-... | 05/15/2012 |
| 8174680 | Substrate handler, lithographic apparatus and device manufacturing method An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The a... | 05/08/2012 |
| 8174678 | Lithographic apparatus with adjusted exposure slit shape enabling reduction of focus errors due to substrate topology and device manufacturing method A lithographic apparatus includes an illumination system to condition a radiation beam; a patterning device support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned ... | 05/08/2012 |
| 8174674 | Lithographic apparatus and device manufacturing method An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection ... | 05/08/2012 |
| 8174671 | Lithographic projection apparatus and method for controlling a support structure A control system controls a support structure of a lithographic apparatus. A first measurement system measures the position of a substrate supported by the support structure, in a first coordinate system. A second measurement system measures the position of the supp... | 05/08/2012 |
| 8169593 | Lithographic apparatus and device manufacturing method A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substr... | 05/01/2012 |
| 8164741 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a... | 04/24/2012 |
| 8164740 | Illumination system coherence remover with two sets of stepped mirrors A coherence remover is provided. In an embodiment the coherence remover includes a first mirror and a second mirror coupled to the first mirror. The coherence remover is configured to receive an input beam. Each of the first and second mirrors is configured to refle... | 04/24/2012 |
| 8164737 | Lithographic apparatus having an active damping subassembly A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active d... | 04/24/2012 |
| 8164734 | Vacuum system for immersion photolithography A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from... | 04/24/2012 |
| 8159651 | Illumination system coherence remover with a series of partially reflective surfaces A coherence remover includes a first partially reflective surface and a second partially reflective surface. The coherence remover is configured to receive an input beam. Each of the first and second reflective surfaces is configured to reflect a respective portion ... | 04/17/2012 |
| 8159647 | Lithographic apparatus and device manufacturing method A maskless lithography system has a patterning array assembly formed by a plurality of patterning arrays, each patterning array having a substrate. Each patterning array has a plurality of individually controllable elements to endow an incoming radiation beam with a... | 04/17/2012 |
| 8154709 | Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus A method of placing a substrate onto a surface of a substrate holder, in which the surface is provided with a plurality of burls. Substrate placement data for allowing placement of the substrate at a certain position with respect to a position of the plurality of bu... | 04/10/2012 |
| 8154708 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. ... | 04/10/2012 |
| 8149387 | Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus A method is provided for placing a substrate onto a surface of a substrate holder, the surface having a plurality of burls. First substrate placement data is calculated. This data enables placement of the substrate at a certain position with respect to a position of... | 04/03/2012 |
| 8149379 | Lithographic apparatus and device manufacturing method The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed. ... | 04/03/2012 |
| 8144310 | Positioning system, lithographic apparatus and device manufacturing method A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to... | 03/27/2012 |
| 8144309 | Imprint lithography A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge o... | 03/27/2012 |
| 8144305 | Lithographic apparatus and device manufacturing method An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate. ... | 03/27/2012 |
| 8142964 | Method of designing sets of mask patterns, sets of mask patterns, and device manufacturing method In a multiple-exposure lithographic process a developed resist pattern derived from a first exposure is present within a second resist layer that is exposed in a second exposure of the multiple-exposure lithographic process. The second mask pattern used in the secon... | 03/27/2012 |
| 8142852 | Lithographic apparatus and device manufacturing method In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid. ... | 03/27/2012 |
| 8139218 | Substrate distortion measurement A substrate distortion measurement apparatus comprising one or more optical detectors arranged to measure the locations of pits or holes provided in a substrate, a memory arranged to store previously determined locations of the pits or holes in the substrate, and a ... | 03/20/2012 |
| 8139217 | Alignment systems and methods for lithographic systems An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determi... | 03/20/2012 |
| 8139200 | Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion... | 03/20/2012 |
| 8138486 | Lithographic apparatus and device manufacturing method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap. ... | 03/20/2012 |
| 8138485 | Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths betwee... | 03/20/2012 |
| 8135488 | Controller for a positioning device, method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device A controller for a positioning device is constructed and arranged to receive a position signal indicative of a position of the positioning device, compare the position signal to a set-point signal indicative of a desired position of the positioning device to obtain ... | 03/13/2012 |
| 8134683 | Device manufacturing method, computer program and lithographic apparatus In a lithographic projection apparatus, adjustment of the projection system, e.g. to compensate for lens heating effects, is performed by determining a region of interest for a given pattern and illumination arrangement, the region of interest being a non-circular r... | 03/13/2012 |
| 8134257 | Lithographic apparatus having a lorentz actuator with a composite carrier An actuator is configured to produce a displacement force between a first and a second part to displace the first and second parts relative to each other. The Actuator includes a first magnet subassembly, attached to one of a first and a second part, and an electric... | 03/13/2012 |
| 8134136 | Ex-situ removal of deposition on an optical element A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large... | 03/13/2012 |
| 8131078 | Imprint lithography An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and sepa... | 03/06/2012 |
| 8130366 | Method for coarse wafer alignment in a lithographic apparatus A method for alignment of a substrate, in which the substrate includes a mark in a scribe lane, and the scribe lane extends along a longitudinal direction as a first direction. The mark has a periodic structure in the first direction. The method includes providing a... | 03/06/2012 |
| 8130359 | Lithographic apparatus and a vacuum chamber A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern in its cross-section to form a... | 03/06/2012 |
| 8129702 | Radiation system with contamination barrier A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas... | 03/06/2012 |
| 8129097 | Immersion lithography A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The method includes irradiating an area of the radiation sensitive material ... | 03/06/2012 |
| 8125616 | Lithographic apparatus with pre-formed flexible transportation line A lithographic apparatus includes, in an embodiment, an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cros... | 02/28/2012 |
| 8125615 | Optical focus sensor, an inspection apparatus and a lithographic apparatus To detect whether a substrate is in a focal plane of an inspection apparatus, an optical focus sensor is arranged to receive a radiation beam via an objective lens. The optical focus sensor includes a splitter configured to split the radiation beam into a first sub-... | 02/28/2012 |
