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Assignee: Advanced Thermal Sciences


Location: Anaheim, CA
No. of patents: 3

NumberTitleIssue Date
7442275Lateral temperature equalizing system for large area surfaces during processing
In many processes used in fabricating semiconductors the wafer is seated on the top surface of a pedestal and heated in a high energy process step, such as plasma etching. The pedestal, chuck or platen may be cooling but the wafer gradually heats until the process c...
10/28/2008
7337625Thermal control systems for process tools requiring operation over wide temperature ranges
A system and method for maintaining the temperature of a thermal transfer fluid at a selectable level within a wide temperature range, so as to operate a process tool in a chosen mode employing at lease two cascaded stages, each operating with a different fluid in a...
03/04/2008
7195693Lateral temperature equalizing system for large area surfaces during processing
In many processes used in fabricating semiconductors the wafer is seated on the top surface of a pedestal and heated in a high energy process step, such as plasma etching. The pedestal, chuck or platen may be cooling but the wafer gradually heats until the process c...
03/27/2007
 
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