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Assignee: Acorn Technologies, Inc.


Location: Santa Monica, CA
No. of patents: 13

NumberTitleIssue Date
8003486Method of making a semiconductor device having a strained semiconductor active region using edge relaxation, a buried stressor layer and a sacrificial stressor layer
The present invention relates to creating an active layer of strained semiconductor using a combination of buried and sacrificial stressors. That is, a process can strain an active semiconductor layer by transferring strain from a stressor layer buried below the act...
08/23/2011
7902029Process for fabricating a self-aligned deposited source/drain insulated gate field-effect transistor
Processes for forming self-aligned, deposited source/drain, insulated gate, transistors and, in particular, FETs. By depositing a source/drain in a recess such that it remains only in the recess, the source/drain can be formed self-aligned to a gate and/or a channel...
03/08/2011
7884003Method for depinning the fermi level of a semiconductor at an electrical junction and devices incorporating such junctions
An electrical device in which an interface layer is disposed between and in contact with a metal and a Si-based semiconductor, the interface layer being of a thickness effective to depin of the Fermi level of the semiconductor while still permitting current to flow ...
02/08/2011
7883980Insulated gate field effect transistor having passivated schottky barriers to the channel
A transistor includes a semiconductor channel disposed nearby a gate and in an electrical path between a source and a drain, wherein the channel and at least one of the source or the drain are separated by an interface layer so as to form a channel-interface layer-s...
02/08/2011
7851325Strained semiconductor using elastic edge relaxation, a buried stressor layer and a sacrificial stressor layer
The present invention relates to creating an active layer of strained semiconductor using a combination of buried and sacrificial stressors. That is, a process can strain an active semiconductor layer by transferring strain from a stressor layer buried below the act...
12/14/2010
7816240Method for making semiconductor insulated-gate field-effect transistor having multilayer deposited metal source(s) and/or drain(s)
A metal source/drain field effect transistor is fabricated such that the source/drain regions are deposited, multilayer structures, with at least a second metal deposited on exposed surfaces of a first metal. ...
10/19/2010
7756196Efficient adaptive filters for CDMA wireless systems
A CDMA radio system uses an adaptive filter in a receiver to mitigate multipath radio propagation and to filter out interfering signals. Characteristics of an initial stage of the filter preferably are determined by cross correlation of a generated pilot signal and ...
07/13/2010
7700416Tensile strained semiconductor on insulator using elastic edge relaxation and a sacrificial stressor layer
The process uses a sacrificial stressor layer to provide tensile strained surface regions for bulk silicon or silicon on insulator (SOI) substrates. The process deposits a sacrificial layer of silicon germanium on the surface of the substrate and then patterns the w...
04/20/2010
7639738Efficient channel shortening in communication systems
A communication system includes a channel shortening filter to reduce intersymbol interference and facilitate recovery of communications. The channel shortening filter preferably includes a energy concentration filter that optimizes SNR or SINR or other performance ...
12/29/2009
7615402Electrostatically operated tunneling transistor
A transistor operated by changing the electrostatic potential of an island disposed between two tunnel junctions. The transistor has an island of material which has a band gap (e.g. semiconductor material). Source and drain contacts are provided. The transistor has ...
11/10/2009
7612365Strained silicon with elastic edge relaxation
A thin blanket epitaxial layer of SiGe is grown on a silicon substrate to have a biaxial compressive stress in the growth plane. A thin epitaxial layer of silicon is deposited on the SiGe layer, with the SiGe layer having a thickness less than its critical thickness...
11/03/2009
7599426Use of adaptive filters in multiple access wireless systems employing predictable signals
A code division multiple access (CDMA) radio system uses an adaptive filter in a receiver to mitigate multipath radio propagation and to filter out interfering signals. Characteristics of an initial stage of the filter preferably are determined by cross correlation ...
10/06/2009
7462860Method for depinning the Fermi level of a semiconductor at an electrical junction and devices incorporating such junctions
An electrical device in which an interface layer is disposed between and in contact with a metal and a Si-based semiconductor, the interface layer being of a thickness effective to depin of the Fermi level of the semiconductor while still permitting current to flow ...
12/09/2008
 
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