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Assignee: AST Elekronik GmbH


Location: Kirchheim, DE
No. of patents: 3

NumberTitleIssue Date
5628564Method and apparatus for wavevector selective pyrometry in rapid thermal processing systems
A method and apparatus for optical pyrometry in a Rapid Thermal Processing (RTP) System, whereby the radiation used to heat the object to be processed in the RTP system is in part specularly reflected from specularly reflecting surfaces and is incident on...
05/13/1997
5580830Modified reaction chamber and improved gas flushing method in rapid thermal processing apparatus
A reaction chamber for a Rapid Thermal Processing (RTP) system contains an aperture to allow introduction and removal of the object to be processed. The cross sectional area of the aperture is significantly less than the cross sectional area of the reacti...
12/03/1996
5359693Method and apparatus for a rapid thermal processing of delicate components
A low defect rate is provided in rapid thermal processing of delicate components with reduction of defects caused by inhomogeneities of temperature during a rapid thermal processing. In a suitable system a defect-guarded RTP method is carried out in such ...
10/25/1994
 
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