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| Number | Title | Issue Date |
| 8089672 | Array element device control method and apparatus A method of controlling an element of an array of individually controllable elements. The method includes varying a frequency of a driving voltage with which the element is driven. ... | 01/03/2012 |
| 8089613 | Lithographic apparatus, excimer laser and device manufacturing method A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch... | 01/03/2012 |
| 8086348 | Method of transferring a substrate, transfer system and lithographic projection apparatus A method is provided for transferring a substrate from a first substrate holder, e.g., a pre-alignment unit, to a second substrate holder, e.g., a substrate table in a lithographic apparatus, by means of a transfer unit on the basis of transfer data available theret... | 12/27/2011 |
| 8080462 | Mark structure for coarse wafer alignment and method for manufacturing such a mark structure A method for forming a mark structure on a substrate comprising a plurality of lines. The lines extend parallel to each other in a first direction and are arranged with a pitch between each pair of lines that is directed in a second direction perpendicular to the fi... | 12/20/2011 |
| RE43036 | Filter for extreme ultraviolet lithography An apparatus, suited, for example, for extreme ultraviolet lithography, includes a radiation source and a processing organ for processing the radiation from the radiation source. Between the radiation source and the processing organ a filter is placed which, in the ... | 12/20/2011 |
| 8077291 | Substrate placement in immersion lithography A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position o... | 12/13/2011 |
| 8077287 | Method of preparing components, prepared component, lithographic apparatus and device manufacturing method A method of preparing components for use in a vacuum chamber of a lithographic apparatus is disclosed. The method includes coating the component with a non-metallic material. The method may further include treating the coating so as to harden the coating. Preferably... | 12/13/2011 |
| 8072700 | Optical apparatus for use in photolithography An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from t... | 12/06/2011 |
| 8072615 | Alignment method, alignment system, and product with alignment mark The position of a product is measured using an alignment mark on the product. Radiation is transmitted towards the alignment mark and diffracted by a pattern in the alignment mark. Position information is determined from phase relations of the diffracted radiation. ... | 12/06/2011 |
| 8072575 | Lithographic apparatus with temperature sensor and device manufacturing method In an embodiment, a lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, wherein the lithographic apparatus includes an air shower and a temperature sensor positioned near the air shower for measuring the temperature of... | 12/06/2011 |
| 8071963 | Debris mitigation system and lithographic apparatus A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a ... | 12/06/2011 |
| 8068212 | Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements A lithographic apparatus configured to apply corrections to the dose, within and/or between fields, to compensate for critical dimension variations due to heating of elements of the projection system is disclosed. ... | 11/29/2011 |
| 8068210 | Lithographic apparatus, device manufacturing method and computer program product Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity. ... | 11/29/2011 |
| 8065636 | System and method for creating a focus-exposure model of a lithography process A system and a method for creating a focus-exposure model of a lithography process are disclosed. The system and the method utilize calibration data along multiple dimensions of parameter variations, in particular within an exposure-defocus process window space. The... | 11/22/2011 |
| 8064730 | Device manufacturing method, orientation determination method and lithographic apparatus A method to determine a rotation of a substrate with respect to the patterning device without using a reference mark on the substrate is presented. At least two structures having corresponding features and present on the substrate, e.g. previously projected patterns... | 11/22/2011 |
| 8064151 | Lithographic apparatus and thermal optical manipulator control method A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control ... | 11/22/2011 |
| 8064056 | Substrate used in a method and apparatus for angular-resolved spectroscopic lithography characterization A substrate includes an overlay target. The overlay target can include two superposed layers. Each of the two superposed layers includes two gratings with a different pitch from each other. ... | 11/22/2011 |
| 8064045 | Method of transferring a substrate, transfer system and lithographic projection apparatus The invention relates to a method of transferring a substrate from a first substrate holder to a second substrate holder in a lithographic projection apparatus by using a transfer unit on the basis of transfer data available thereto. The second substrate holder has ... | 11/22/2011 |
| 8064038 | Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and ... | 11/22/2011 |
| 8059266 | Radiometric Kirk test Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present invention involves a test pattern having an isolated dark area within a ... | 11/15/2011 |
| 8059261 | Masking device, lithographic apparatus, and device manufacturing method A lithographic projection apparatus having a masking device for obscuring part of at least one of a patterning device used for patterning a projection beam before imaging the patterned beam onto a substrate. The masking device includes a first masking structure to o... | 11/15/2011 |
| 8059259 | Damping arrangement, active damping system, lithographic apparatus, and projection assembly An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure... | 11/15/2011 |
| 8057967 | Process window signature patterns for lithography process control A method for identifying process window signature patterns in a device area of a mask is disclosed. The signature patterns collectively provide a unique response to changes in a set of process condition parameters to the lithography process. The signature patterns e... | 11/15/2011 |
| 8056028 | Method of performing mask-writer tuning and optimization A model-based tuning method for tuning a first mask writer unit utilizing a reference mask writer unit, each of which has tunable parameters for controlling mask writing performance. The method includes the steps of defining a test pattern and a mask writing model; ... | 11/08/2011 |
| 8054467 | Method and apparatus for angular-resolved spectroscopic lithography characterization An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength depende... | 11/08/2011 |
| 8054445 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus in which a liquid supply system and the geometry of the objects on the substrate table are arranged to avoid high velocity immersion liquid flowing over sensors. ... | 11/08/2011 |
| 8052289 | Mirror array for lithography A mirror array apparatus includes a carrier configured to support a plurality of individually adjustable reflective elements. At least one actuator is associated with each reflective element, the actuator being configured to adjust the orientation or position of the... | 11/08/2011 |
| 8049865 | Lithographic system, device manufacturing method, and mask optimization method A lithographic system comprises an array of individually controllable elements, a projection system, datapath hardware, and a conversion system. The array of individually controllable elements is capable of modulating a radiation beam. The projection system is confi... | 11/01/2011 |
| 8049864 | Device manufacturing method and lithographic apparatus A device manufacturing method includes a measurement phase and an exposure phase. The measurement phase includes conditioning a radiation beam with a first beam condition, forming the patterned radiation beam by imparting the radiation beam with the first beam condi... | 11/01/2011 |
| 8045137 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane sub... | 10/25/2011 |
| 8045135 | Lithographic apparatus with a fluid combining unit and related device manufacturing method A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may b... | 10/25/2011 |
| 8045134 | Lithographic apparatus, control system and device manufacturing method An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the... | 10/25/2011 |
| 8044373 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed having a projection system housing supporting internally one or more lens elements, and a movement damper connected to the projection system housing, the movement damper configured to damp movement of the projection system housi... | 10/25/2011 |
| 8043797 | Lithographic apparatus and device manufacturing method A method for transferring an image of a mask pattern through a pitch range onto a substrate is presented. In an embodiment, the method includes illuminating the mask pattern of an attenuated phase shift mask using a multipole illumination that includes an on-axis co... | 10/25/2011 |
| 8043085 | Imprint lithography An imprint lithography apparatus is disclosed that has a first support structure arranged to support an imprint template, and a first actuator attached to the first support structure, and arranged in use to be located between the first support structure and the impr... | 10/25/2011 |
| RE42849 | Lithographic apparatus and device manufacturing method An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from th... | 10/18/2011 |
| 8035798 | Lithographic apparatus and device manufacturing method A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between ... | 10/11/2011 |
| 8031404 | Fly's eye integrator, illuminator, lithographic apparatus and method A transmissive fly's eye integrator is disclosed that includes a first array of lenses and a second array of lenses. The first array of lenses and second array of lenses together form a fly's eye integrator, and the first array of lenses and second array of lenses c... | 10/04/2011 |
| 8031337 | Angularly resolved scatterometer An angularly resolved scatterometer uses a broadband radiation source and an acousto-optical tunable filter to select one or more narrowband components from the broadband beam emitted by the source for use in measurements. A feedback loop can be used to control the ... | 10/04/2011 |
| 8031325 | Lithographic apparatus and device manufacturing method A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liqu... | 10/04/2011 |
