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Assignee: ADE Optical Systems Corporation


Location: Charlotte, NC
No. of patents: 8

NumberTitleIssue Date
6529270Apparatus and method for detecting defects in the surface of a workpiece
The present invention provides apparatus and methods for scanning a workpiece for defects with increased resolution and sensitivity relative to conventional workpiece inspection systems. Specifically, the apparatus and methods of the present invention rep...
03/04/2003
6509965Wafer inspection system for distinguishing pits and particles
A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system compr...
01/21/2003
6292259Wafer inspection system for distinguishing pits and particles
A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system compr...
09/18/2001
6122047Methods and apparatus for identifying the material of a particle occurring on the surface of a substrate
The composition of a particle occurring on the surface of a smooth substrate is identified by impinging the surface with a light beam having a strong P-polarized component at an oblique angle of incidence to the surface, and collecting light scattered fro...
09/19/2000
6118525Wafer inspection system for distinguishing pits and particles
A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system compr...
09/12/2000
5988971Wafer transfer robot
In one aspect, the present invention provides an apparatus for transferring wafers to or from a wafer cassette having a plurality of wafer-receiving slots, wherein the apparatus comprises a wafer paddle which is adapted to be inserted into a wafer cassett...
11/23/1999
5712701Surface inspection system and method of inspecting surface of workpiece
A surface inspection system and methods of inspecting a surface of a workpiece are provided for detecting particles, defects, or other surface characteristics in or on a surface of the workpiece. The surface inspection system preferably has a transporter ...
01/27/1998
5691812Calibration standard for calibrating a defect inspection system and a method of forming same
The calibration standard has artificial defects of a predetermined uniform size disposed on selected areas of a substrate. The artificial defects are randomly spaced within the selected area and of a sufficient density as to be visually discernable throug...
11/25/1997
 
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