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| Number | Title | Issue Date |
| 8137787 | Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system for supplying fluid and exhausting gas The object of the present invention is to form a chromium-oxide film, excellent in corrosion resistance, without containing an oxide film of other metal onto the metallic material. The chromium-oxide passivation film, excellent in corrosion resistance, without conta... | 03/20/2012 |
| 8114245 | Plasma etching device A plasma etching device which has an auxiliary electrode enabling realization of a uniform plasma density of generated plasma on the surface of a base and which enables uniform etching with respect to the base without depending upon pressure and without rotating a m... | 02/14/2012 |
| RE42420 | Liquid feed nozzle, wet treatment apparatus and wet treatment method The wet treatment liquid feed nozzle of the invention comprises an introducing path having an introducing port, a discharging path having a discharging port, a crossing section formed by causing the introducing path and the discharging path to cross at the other end... | 06/07/2011 |
| 7935385 | Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system for supplying fluid and exhausting gas The object of the present invention is to form a chromium-oxide film excellent in corrosion resistance without containing an oxide film of other metal onto the optional metallic material. The chromium-oxide passivation film excellent in corrosion resistance without ... | 05/03/2011 |
| 7296048 | Semiconductor circuit for arithmetic processing and arithmetic processing method There is provided a semiconductor circuit for arithmetic processing and an arithmetic processing method that can increase the rate of processing data and reduces the area of a circuit by suppressing wasteful processing. There is provided a computing unit for ... | 11/13/2007 |
| 7185421 | Method and apparatus for manufacturing multilayer printed wiring board The present invention has an object to provide a producing method and producing apparatus of multilayered printed-circuit board that has eliminated the resin flow and resolved the problems of board thickness discrepancy and misregistration. A producing method... | 03/06/2007 |
| 6962283 | Welding method for fluorine-passivated member for welding, fluorine-passivated method after being weld, and welded parts priority data The present invention provides a welding method for materials to be welded which are subjected to fluoride passivation treatment, and a fluoride passivation retreatment method, wherein, when fluoride passivation retreatment was conducted after welding, there is no g... | 11/08/2005 |
| 6940034 | Long life welding electrode and its fixing structure, welding head, and welding method A fixing structure for a welding electrode and a welding head is shown which enable improvement of durability of a welding electrode, improvement of work efficiency in welding, and a reduction of time required for welding and also which make it possible to execute w... | 09/06/2005 |
| 6818320 | Welding method for welded members subjected to fluoride passivation treatment, fluoride passivation retreatment method, and welded parts A welding method for materials to be welded which are subjected to fluoride passivation treatment, and a fluoride passivation retreatment method, wherein, when fluoride passivation retreatment is conducted after welding, there is no generation of particles or dust. ... | 11/16/2004 |
| 6801554 | Laser oscillating apparatus, exposure apparatus, and device fabrication method An excimer laser gas in a laser tube 2 is excited by a microwave introduced from awaveguide 1, and electric field concentration occurs in a slit-shaped gap 3 provided in a plate member 11c, causing plasma discharge. Then the phase ... | 10/05/2004 |
| 6792889 | Plasma processing apparatus and method capable of performing uniform plasma treatment by control of excitation power A plasma processing apparatus includes a chassis accommodating an impedance matching circuit. The impedance matching circuit is placed between an RF generator and a plasma excitation electrode. Magnetic probes for detecting a magnetic field generated at a slit in a ... | 09/21/2004 |
| 6719875 | Plasma process apparatus The plasma process apparatus is capable of uniformalizing the density of a plasma generated thereby and a self-bias voltage associated therewith. This apparatus include two parallel plates electrodes I and II, one of electrodes I and II being configured for carrying... | 04/13/2004 |
| 6585851 | Plasma etching device A plasma etching device which has an auxiliary electrode enabling realization of a uniform plasma density of generated plasma on the surface of a base and which enables uniform etching with respect to the base without depending upon pressure and without r... | 07/01/2003 |
| 6563072 | Welding technique for forming passive chromium oxide film in weld and gas feed system for welding Welding of material such as a piping using ferrite system stainless steel, in which a back sealed gas used for conventional welding is switched from argon gas (or a hydrogen gas/argon gas mix) to an argon gas to which an oxidizing gas is doped at the time... | 05/13/2003 |
| 6559674 | Variable function information processor There can be provided a variable function information processor in which a logic module (10) with the further decreased number of transistors used in the logic module constituting the variable function information processor is provided, a function of bein... | 05/06/2003 |
| 6527908 | Plasma process apparatus A plasma process apparatus capable of preventing generation of plasma in an unwanted location and performing uniform plasma processing with stability is obtained. The plasma process apparatus includes a processing chamber having an internal wall surface; ... | 03/04/2003 |
| 6494223 | Wet cleaning apparatus utilizing ultra-pure water rinse liquid with hydrogen gas A wet cleaning apparatus can remove trace heavy metals, colloidal matter or other impurities contained in ultra-pure water to be used as rinse water in semiconductor cleaning processes and suppress deposit of trace impurities such as heavy metals or other... | 12/17/2002 |
| 6456992 | Semiconductor arithmetic circuit A semiconductor arithmetic circuit which compares the magnitudes of a plurality of data with each other in real time by using a simple circuit. The semiconductor arithmetic circuit containing one or more neuron MOS transistors each having a plurality of input ... | 09/24/2002 |
| 6446573 | Plasma process device A plasma process device capable of forming homogeneous plasma and coping with a large size substrate less costly can be obtained. The plasma process device includes a processing chamber, microwave guiding means, a shower plate and a reaction gas supply pa... | 09/10/2002 |
| 6436353 | Gas recovering apparatus The present invention makes possible the recycling of exhaust has components in a manufacturing process by cooling, liquefaction, and recovery, and to use toxic or useful gases without disposal, and to dramatically reduce the frequency of exhaust system m... | 08/20/2002 |
| 6394415 | Fluid control valve and fluid supply/exhaust system A fluid control valve, which can control a fluid having a pressure in the order of 10 kg/cm2, has a response time in the order of several milliseconds can be made small in size, and a fluid supply/exhaust system that provides less gas counter f... | 05/28/2002 |
| 6378192 | Method of fixing a plurality of lower members each having reference bore for installing upper member, and fixing jigs First and second two spacing jigs 81 are used each having a rectangular parallelepipedal body 81a formed on the bottom surface thereof with projections 82 which are arranged side by side at a spacing equal to a predetermined interval between reference bor... | 04/30/2002 |
| 6370897 | Semiconductor manufacturing facility A cooling jacket unit (5) is provided to a periphery of a heating furnace of a heat treatment apparatus. A cooling unit has a double water jacket comprising an inner fluid passage (51) and an outer fluid passage (52), and cooling water supplied to the out... | 04/16/2002 |
| 6357385 | Plasma device A plasma device which is provided with a container, a gas supply system, and an exhaust system. The container is composed of a first dielectric plate made of a material capable of transmitting microwaves. An antenna for radiating microwaves is located on ... | 03/19/2002 |
| 6348157 | Cleaning method A cleaning method capable of processing at room temperatures without conducting heating, uses little chemicals and water, and does not require special devices or materials. The chemical cleaning processes and rinse processes employ pure water or ultrapure... | 02/19/2002 |
| 6334120 | Semiconductor arithmetic circuit and data processing device A semiconductor device capable of executing size comparison operations on a plurality of data at high speed and in real time and using simple circuitry. An inverter circuit group is used containing a plurality of inverter circuits constructed using neuron... | 12/25/2001 |
| 6314992 | Fluid-switchable flow rate control system A fluid-switchable flow rate control system that permits free changing of the full scale flow rate and which can control a plurality of kinds of fluids with high precision. The fluid-switchable flow rate control system controls the flow rate of fluid with... | 11/13/2001 |
| 6302130 | Method and apparatus for detection of orifice clogging in pressure-type flow rate controllers A method and apparatus for detection of clogging of an orifice by measuring the upstream side pressure without breaking up the piping system in a flow rate control unit using an orifice, so as to extend the life of the flow rate control unit and enhance i... | 10/16/2001 |
| 6289923 | Gas supply system equipped with pressure-type flow rate control unit An improved and reduced-size and low-cost gas supply system equipped with a pressure-type flow rate control unit, to be used, for instance, in semiconductor manufacturing facilities is disclosed. Transient flow rate characteristics are improved to prevent... | 09/18/2001 |
| 6273477 | Gasket and pipe joint A pipe joint comprises a pair of tubular joint members, an annular gasket interposed between opposed end faces of the two joint members, and threaded means for joining the two joint members. Each of the joint members is prepared from a stainless steel hav... | 08/14/2001 |
| 6220500 | Welding method for fluorine-passivated member for welding, fluorine-passivation method after being weld, and welded parts A welding method for materials to be welded which are subjected to fluoride passivation treatment, and a fluoride passivation retreatment method, wherein, when fluoride passivation retreatment is conducted after welding, there is no generation of particle... | 04/24/2001 |
| 6217633 | Method and apparatus for recovering rare gas A process and an apparatus for recovering a noble gas, which can recover a noble gas exhausted from a noble gas employing system efficiently and also can supply the noble gas of a predetermined purity to the noble gas employing system and which can reduce... | 04/17/2001 |
| 6215806 | Excimer laser generator provided with a laser chamber with a fluoride passivated inner surface An excimer laser generating system includes a laser chamber whose inner surface is covered with a fluorine-passivated surface. Preferably, the surfaces of a blower and heat exchanger disposed in the laser chamber are also covered with a fluorine-passivate... | 04/10/2001 |
| 6199092 | Semiconductor arithmetic circuit A semiconductor arithmetic circuit including 2 MOS (Metal Oxide Semiconductor) type transistors, the source electrodes of which are connected to one another and having gate electrodes connected to a signal line having a predetermined potential via switchi... | 03/06/2001 |
| 6193212 | Fluid control valve and fluid supply/exhaust system A fluid control valve, which can control a fluid having a pressure in the order of 10 kg/cm2, has a response time in the order of several milliseconds can be made small in size, and a fluid supply/exhaust system that provides less gas counter f... | 02/27/2001 |
| 6180067 | Reactor for the generation of water An improved reactor for generating water from hydrogen and oxygen which allows production of moisture at a high conversion rate exceeding 99 percent with the temperature kept under some 400° C. inside the reactor shell (1) and with the water vapor produc... | 01/30/2001 |
| 6158679 | Orifice for pressure type flow rate control unit and process for manufacturing orifice An orifice for a pressure-type flow rate controller, which can be produced by a simple method at a low cost, that provides a linearity--between the pressure P1 on the upstream side of the orifice and the flow rate--over a wide range of the pressure ratio ... | 12/12/2000 |
| 6155202 | Plasma processing apparatus, matching box, and feeder In a plasma processing apparatus, in a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode, one o... | 12/05/2000 |
| 6153068 | Parallel plate sputtering device with RF powered auxiliary electrodes and applied external magnetic field The present invention provides a sputtering device provided with two electrodes I and II of parallel plate type within a vessel inside which pressure can be reduced, wherein: a target to be sputtered is placed on said electrode I, and a base body on which... | 11/28/2000 |
| 6152168 | Pressure-type flow rate control apparatus A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate con... | 11/28/2000 |
