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Assignee: Nakamura; Eiichi


Location: Tokyo, JP
No. of patents: 5

NumberTitleIssue Date
7547429Fullerene derivatives and processes for producing the same
The present invention relates to a fullerene derivative having a partial structure represented by the general formula (I): wherein C1 to C8 are carbon atoms constituting a fullerene skeleton in which C...
06/16/2009
7202374Fullerene derivatives and their metal complexes
A metal complex contains at least one ligand, each having the form of a molecule of a fullerene derivative or an anion of the fullerene derivative, where the fullerene derivative, with a solubility in n-hexane of not lower that 0.1 mg/ml at 250° C., includes a full...
04/10/2007
6969772Fullerene derivatives and their metal complexes
A fullerene derivative, with a solubility in n-hexane of not lower that 0.1 mg/ml at 25° C., includes a fullerene skeleton and three or more organic groups attached to the fullerene skeleton, where each of the organic groups is represented by the general formula (I...
11/29/2005
6765098Fullerene derivatives
A novel means for DNA compaction is provided. The object is accomplished by providing a fullerene derivative having 1 to 4 nitrogen-containing hydrophilic side chain(s) or its salt for DNA compaction. DNA compaction can be achieved effectively, and app...
07/20/2004
6271425Process for producing alcohols
A novel process for producing alcohols, characterized by reacting an organic halide represented by the formula R--X (wherein R means an organic residue and X means a halogen atom) with oxygen molecules in the presence of an organotin compound and a reduci...
08/07/2001
 
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