Did You Know...
...that the x-ray was discovered purely by accident? When German physicist Wilhelm Konrad von Roentgen was experimenting with cathode rays in 1895, he put an activated Crookes tube in a book and went out to lunch. When he returned, he discovered that a key that had also been placed in the book showed up as an image on the developed film!
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| Application No. | Application Title | Issue Date |
| 20120067866 | THERMALLY ZONED SUBSTRATE HOLDER ASSEMBLY A thermally zoned substrate holder including a substantially cylindrical base having top and bottom surfaces configured to support a substrate. A plurality of temperature control elements are disposed within the base. An insulator thermally separates the temperature con... | 03/22/2012 |
| 20120067523 | TUNER AND MICROWAVE PLASMA SOURCE A tuner matching an impedance of a load in the chamber to a characteristic impedance of the microwave power source is provided. The tuner includes: a body having a tubular outer conductor and a tubular inner conductor coaxially provided in the outer conductor, the body ... | 03/22/2012 |
| 20120052457 | THERMAL PROCESSING APPARATUS There is provided a thermal processing apparatus in which the outer shell of a vacuum insulation layer-forming structure has an increased buckling strength. The thermal processing apparatus 1 includes a cylindrical reaction tube 3, a boat 5 for hold... | 03/01/2012 |
| 20120048310 | CLEANING METHOD In a process chamber of a substrate processing apparatus, such as an RTP apparatus, a carrier is placed and configured to carry out a contaminant that has been attached to it. In this state, a cleaning gas containing N2 and O2 is introduced into th... | 03/01/2012 |
| 20120046904 | SUBSTRATE CARRYING MECHANISM, SUBSTRATE CARRYING METHOD AND RECORDING MEDIUM STORING PROGRAM INCLUDING SET OF INSTRUCTIONS TO BE EXECUTED TO ACCOMPLISH THE SUBSTRATE CARRYING METHOD A substrate carrying mechanism includes: a base; a substrate holding member placed on the base and capable of holding a substrate and of being advanced and retracted relative to the base; four or more detecting units respectively for detecting different parts of the edg... | 02/23/2012 |
| 20120046774 | SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD ADOPTED IN SUBSTRATE PROCESSING APPARATUS AND PROGRAM A substrate processing apparatus according to the present invention comprises a plurality of processing chambers, discharge systems each provided in conjunction with one of the processing chambers and a common discharge system connected with the discharge systems of at ... | 02/23/2012 |
| 20120040085 | METHOD FOR FORMING Cu FILM AND STORAGE MEDIUM In a method for forming a Cu film, a wafer (W) is loaded into a chamber 1. Then, Cu(hfac)TMVS as a monovalent Cu β-diketone complex and a reducing agent for reducing Cu(hfac)TMVS are introduced into the chamber 1 in a vapor state. Thus, a Cu film is forme... | 02/16/2012 |
| 20120031334 | GAS EXHAUST SYSTEM OF FILM-FORMING APPARATUS, FILM-FORMING APPARATUS, AND METHOD FOR PROCESSING EXHAUST GAS A film-forming apparatus includes a processing chamber, and TiCl4 gas and NH3 gas are supplied into the processing chamber for forming a TiN film on a substrate W in the processing chamber by CVD. The processing chamber has a gas exhaust system. Th... | 02/09/2012 |
| 20120028462 | METHOD FOR FORMING CU FILM AND STORAGE MEDIUM In a method for forming a Cu film, a CVD Cu film is formed on a CVD-Ru film that is formed on a wafer W. In the method, the wafer W having the CVD-Ru film is loaded into a chamber 1, and a film-forming source material in a vapor state is introduced into the chamber 1. T... | 02/02/2012 |
| 20120022836 | METHOD FOR AUTOMATED DETERMINATION OF AN OPTIMALLY PARAMETERIZED SCATTEROMETRY MODEL Provided is an automated determination of an optimized parameterization of a scatterometry model for analysis of a sample diffracting structure having unknown parameters. A preprocessor determines from a plurality of floating model parameters, a reduced set of model par... | 01/26/2012 |
| 20110270465 | TEMPERATURE SETTING METHOD OF HEAT PROCESSING PLATE, TEMPERATURE SETTING APPARATUS OF HEAT PROCESSING PLATE, PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM RECORDING PROGRAM THEREON An object of the present invention is to perform temperature setting of a heating plate so that a wafer is uniformly heated in an actual heat processing time. The temperature of a wafer is measured during a heat processing period from immediately after a temperature mea... | 11/03/2011 |
| 20110268870 | FILM FORMING APPARATUS AND FILM FORMING METHOD In an apparatus for film formation, constituted so that an organic EL molecular gas is ejected into an ejection vessel, a plurality of organic EL material vessels are provided together with a piping system for connecting the plurality of organic EL material vessels to t... | 11/03/2011 |
| 20110268511 | SUBSTRATE CARRYING DEVICE, SUBSTRATE CARRYING METHOD AND COMPUTER-READABLE STORAGE MEDIUM The substrate carrying device includes a carrying passage forming member forming a carrying passage along which a substrate is carried, exhaust grooves extending parallel to the carrying passage in the upper surface of the carrying passage forming member, a plurality of... | 11/03/2011 |
| 20110265895 | GAS SUPPLY APPARATUS FOR SEMICONDUCTOR MANUFACTURING APPARATUS There is provided a gas supply apparatus 10 which does not necessitate installation of a pressure type flow controller for each processing reactor and which enables a compact construction of the flow controller. The gas supply apparatus 10 includes gas sup... | 11/03/2011 |
| 20110262623 | COATER/DEVELOPER, METHOD OF COATING AND DEVELOPING RESIST FILM, AND COMPUTER READABLE STORING MEDIUM A transfer flow is produced in accordance with a process recipe of a process to be carried out. In the transfer flow, a type of modules listed in accordance with a substrate transfer order is associated with a necessary staying time from when the substrate is transferre... | 10/27/2011 |
| 20120015307 | COATING AND DEVELOPING APPARATUS AND METHOD, AND STORAGE MEDIUM In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-... | 01/19/2012 |
| 20120013859 | COATING AND DEVELOPING APPARATUS AND METHOD In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other. The apparatus has a... | 01/19/2012 |
| 20120009786 | PLASMA PROCESSING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE A plasma processing method in which performing a plasma etching on metal layers formed on a substrate is conducted to form a pattern having the metal layers in a stacked structure, and then a deposit containing a metal that forms the metal layers and being deposited on ... | 01/12/2012 |
| 20120009528 | COATING AND DEVELOPING APPARATUS AND METHOD In one embodiment, a coating and developing apparatus includes a processing block including a vertical stack of early-stage processing unit blocks; a vertical stack of later-stage processing unit blocks disposed laterally adjacent to respective ones of the early-stage p... | 01/12/2012 |
| 20120006782 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS A substrate processing method for removing a copper oxide film on a surface of Cu and a Cu-containing residue adhered to an interlayer insulating film in a Cu wiring structure on a substrate by using an organic acid-containing gas is provided. The substrate processing m... | 01/12/2012 |
| 20120006488 | RING-SHAPED COMPONENT FOR USE IN A PLASMA PROCESSING, PLASMA PROCESSING APPARATUS AND OUTER RING-SHAPED MEMBER A ring-shaped component for use in a plasma processing includes an inner ring-shaped member provided to surround an outer periphery of a substrate to be subjected to the plasma processing and an outer ring-shaped member provided to surround an outer periphery of the inn... | 01/12/2012 |
| 20120006362 | SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD A substrate cleaning device and a substrate cleaning method reduces liquid drops remaining on a substrate to prevent the irregular heating of the substrate by a heating process due to liquid drops or water marks remaining on the substrate. A cleaning liquid is poured th... | 01/12/2012 |
| 20110312190 | COATING METHOD AND COATING APPARATUS A coating method based on such a technique includes a prewetting step of supplying a prewetting liquid to the center of a substrate (W) and rotating the substrate thereby spreading the prewetting liquid over the whole surface of a first substrate, and a coating film for... | 12/22/2011 |
| 20110312188 | PROCESSING APPARATUS AND FILM FORMING METHOD A processing apparatus for processing objects, includes: a processing container structure having a bottom opening and including a processing container having a processing space for housing the objects, the container having a nozzle housing area on one side of the proces... | 12/22/2011 |
| 20110309562 | SUPPORT STRUCTURE AND PROCESSING APPARATUS A support structure for supporting a plurality of objects to be processed and to be disposed in a processing container structure in which a processing gas flows from the bottom to the top or from the top to the bottom, includes: a top plate portion; a bottom portion; an... | 12/22/2011 |
| 20110303152 | SUPPORT STRUCTURE, PROCESSING CONTAINER STRUCTURE AND PROCESSING APPARATUS A support structure for supporting a plurality of objects to be processed and to be disposed in a processing container structure in which a processing gas flows horizontally from one side to the opposite side, includes a top plate section; a bottom section; and a plural... | 12/15/2011 |
| 20110298465 | PROCESS MONITOR AND SEMICONDUCTOR MANUFACTURING APPARATUS A sensor on a semiconductor wafer is used as a process monitor and a capacitor is employed as a power supply for the sensor. The capacitor can be formed by stacking a poly-silicon layer and a silicon nitride layer on the wafer. A timer can be used to specify an operatio... | 12/08/2011 |
| 20110297257 | SUBSTRATE LIQUID PROCESSING APPARATUS, METHOD OF CONTROLLING SUBSTRATE LIQUID PROCESSING APPARATUS, AND STORAGE MEDIUM PERFORMING SUBSTRATE LIQUID PROCESSING APPARATUS CONTROL METHOD ON SUBSTRATE LIQUID PROCESSING APPARATUS A substrate liquid processing apparatus includes a placement table configured to hold a substrate, a rotary driving unit configured to rotate the placement table, a liquid supply unit configured to supply a liquid to the substrate placed on the placement table, and an u... | 12/08/2011 |
| 20110297192 | SUBSTRATE LIQUID PROCESSING APPARATUS A substrate liquid processing apparatus of the present invention includes a process-liquid supply unit selectively supplying a plurality of types of process-liquids to the substrate held by a substrate holding table, first and second guide cups which are disposed in thi... | 12/08/2011 |
| 20110290279 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM STORING COMPUTER PROGRAM FOR PERFORMING SUBSTRATE PROCESSING METHOD A substrate processing apparatus according to the present invention includes a process tank including a pair of opposed sidewalls, storing a chemical liquid therein and processing a plurality of substrates by the chemical liquid; a substrate holding mechanism including ... | 12/01/2011 |
| 20110287172 | SUBSTRATE PROCESSING APPARATUS, CONTROL DEVICE THEREOF, AND CONTROL METHOD THEREOF A process gas supply cycle pattern that will adversely affect the result of processing is changed beforehand. Based on information supplied from a setting input section, a pattern computation section obtains the result of computation of a process gas supply cycle patter... | 11/24/2011 |
| 20110286738 | WET-PROCESSING APPARATUS A wet-processing apparatus, which spouts a coating liquid onto a surface of a substrate of a substrate, includes: nozzles provided with passages for the coating liquid; a light source which illuminates an area between a plane containing the tips of the nozzles and the s... | 11/24/2011 |
| 20110283942 | FILM FORMING APPARATUS AND GAS INJECTION MEMBER A film forming apparatus includes: a chamber for holding a wafer; a susceptor on which the wafer is placed within the chamber; heaters which heat the wafer placed on the susceptor; and a shower plate disposed opposite to the susceptor to inject a film formation processi... | 11/24/2011 |
| 20110253311 | SUBSTRATE PROCESSING APPARATUS FOR PERFORMING PLASMA PROCESS A substrate processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate. The apparatus includes a gas feed passage configured to supply a process gas into the process container an... | 10/20/2011 |
| 20110242513 | SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM A processing temperature of thermal processing is corrected based on measurement of a first dimension of a resist pattern on a substrate from a previously obtained relation between a dimension of a resist pattern and a temperature of thermal processing, a second dimensi... | 10/06/2011 |
| 20110233170 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD A plasma processing apparatus includes a vacuum evacuable processing chamber, at least a portion of which is formed of a dielectric window; a substrate supporting unit for supporting a target substrate in the processing chamber; and a processing gas supply unit for supp... | 09/29/2011 |
| 20110223552 | VERTICAL HEAT TREATMENT APPARATUS AND METHOD FOR COOLING THE APPARATUS A vertical heat treatment apparatus including a furnace body having a heating section in the inner circumferential surface; a treatment container for housing a plurality of objects W to be treated. An air supply line is connected to the furnace body, and an air exhaust ... | 09/15/2011 |
| 20110220157 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM STORING A COMPUTER PROGRAM FOR PERFORMING SUBSTRATE PROCESSING METHOD A substrate processing apparatus according to the present invention comprises: a processing part configured to process a substrate; a chemical-liquid storing container configured to store a chemical liquid; a chemical-liquid supply driving part configured to supply the ... | 09/15/2011 |
| 20110220089 | VERTICAL HEAT TREATMENT APPARATUS AND ASSEMBLY OF PRESSURE DETECTION SYSTEM AND TEMPERATURE SENSOR A vertical heat treatment apparatus including a furnace body having heater elements, and a treatment container, disposed in the furnace body, for housing and heat treating objects W to be treated. An air supply line and an air exhaust line are connected to the furnace b... | 09/15/2011 |
| 20110217473 | WET PROCESSING APPARATUS, WET PROCESSING METHOD AND STORAGE MEDIUM A wet processing apparatus for wet-processing substrates can suppress the reduction of throughput when some component part thereof becomes unserviceable. The wet processing apparatus includes a first nozzle unit and a second nozzle unit. When the wet processing apparatu... | 09/08/2011 |
