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A forehead support apparatus for resting a standing users forehead against a wall above a bathroom commode or urinal or beneath a showerhead.
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| Application No. | Application Title | Issue Date |
| 20110310526 | CAPACITORS WITH HIGH ENERGY STORAGE DENSITY AND LOW ESR Electrostatic capacitors with high capacitance density and high-energy storage are implemented over conventional electrolytic capacitor anode substrates using highly conformal contact layers deposited by atomic layer deposition. Capacitor films that are suitable for ene... | 12/22/2011 |
| 20100301011 | APPARATUS AND METHOD FOR DOWNSTREAM PRESSURE CONTROL AND SUB-ATMOSPHERIC REACTIVE GAS ABATEMENT A sub-atmospheric downstream pressure control apparatus includes a first flow restricting element (FRE); a pressure control chamber (PCC) located in serial fluidic communication downstream from the first FRE; a second FRE located in serial fluidic communication downstre... | 12/02/2010 |
| 20100224804 | FAIL SAFE PNEUMATICALLY ACTUATED VALVE WITH FAST TIME RESPONSE AND ADJUSTABLE CONDUCTANCE Apparatus and method for fail-safe high-speed-pneumatic valve is disclosed. Fail-safe dependability is provided by a spring-loaded normally-closed pneumatic actuator. When the spring-loaded actuator is pressurized, the normally closed mechanism is actuated to the valve ... | 09/09/2010 |
| 20100166957 | PERIMETER PARTITION-VALVE WITH PROTECTED SEALS AND ASSOCIATED SMALL SIZE PROCESS CHAMBERS AND MULTIPLE CHAMBER SYSTEMS A seal-protected perimeter partition valve apparatus defines a vacuum and pressure sealed space within a larger space confining a substrate processing chamber with optimized geometry, minimized footprint, and 360° substrate accessibility. A compact perimeter partitione... | 07/01/2010 |
| 20100043888 | ALD APPARATUS AND METHOD An apparatus and method for atomic layer deposition with improved efficiency of both chemical dose and purge is presented. The apparatus includes an integrated equipment and procedure for chamber maintenance.... | 02/25/2010 |
| 20100003404 | ALD METHOD AND APPARATUS A method and an apparatus for executing efficient and cost-effective Atomic Layer Deposition (ALD) at low temperatures are presented. ALD films such as oxides and nitrides are produced at low temperatures under controllable and mild oxidizing conditions over substrates ... | 01/07/2010 |
