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Assignee: KISCO LTD.


Location: CHUO-KU, JP
No. of applications: 1

Application No.Application TitleIssue Date
20100034970APPARATUS AND METHOD FOR CHEMICAL VAPOR DEPOSITION
A chemical vapor deposition apparatus includes a charging section 10 for charging a feedstock material for vapor deposition, a decomposition oven 2 for decomposing a feedstock material for vapor deposition, an opening/closing valve 4 for interconnec...
02/11/2010
 
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