Did You Know...
...In 1790, the cost to obtain a patent was between $4 and $5.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Application No. | Application Title | Issue Date |
| 20120129358 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Provided are a substrate processing apparatus and a method of manufacturing a semiconductor device that are capable of uniformly heating a substrate while reducing an increase in substrate temperature to reduce a thermal budget. The substrate processing apparatus includ... | 05/24/2012 |
| 20120126355 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS An oxide film capable of suppressing reflection of a lens is formed under a low temperature. A method of manufacturing a semiconductor device includes: (a) forming a lower layer oxide film on a lens formed on a substrate using a first processing source containing a firs... | 05/24/2012 |
| 20120108080 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE A substrate processing apparatus includes a processing chamber configured to process a substrate, a substrate support member provided within the processing chamber to support the substrate, a microwave generator provided outside the processing chamber, a waveguide launc... | 05/03/2012 |
| 20120108077 | SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD Disclosed is a substrate processing apparatus that includes: a substrate supporting member that supports a substrate; a processing chamber capable of housing the substrate supporting member; a rotating mechanism that rotates the substrate supporting member; a carrying m... | 05/03/2012 |
| 20120083120 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE A substrate processing apparatus includes a processing chamber in which a substrate is processed, a substrate holder configured to be loaded into and unloaded from the processing chamber while holding the substrate, a transfer chamber in which a charging operation for c... | 04/05/2012 |
| 20120079985 | METHOD FOR PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS There is provided a substrate processing method, comprising the steps of: supplying source gas into a processing chamber in which substrates are accommodated; removing the source gas and an intermediate body of the source gas remained in the processing chamber; supplyin... | 04/05/2012 |
| 20120071002 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS A process of manufacturing a semiconductor device may be simplified, and oxidation of a metal element-containing film may be suppressed. The method of manufacturing a semiconductor device includes loading a substrate including a metal element-containing film and an insu... | 03/22/2012 |
| 20120070913 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS A method of manufacturing a semiconductor device includes: carrying a substrate having an oxide film and a nitride film stacked thereon into a processing chamber; supporting and heating the substrate using a substrate support member provided in the processing chamber; a... | 03/22/2012 |
| 20120067869 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Provided is a substrate processing apparatus capable of maintaining a temperature of a furnace port part at a heat-resistant temperature or less of each member constituting the furnace part. The substrate processing apparatus includes a process chamber configured to pro... | 03/22/2012 |
| 20120067274 | FILM FORMING APPARATUS, WAFER HOLDER, AND FILM FORMING METHOD A wafer holder used in a film forming apparatus is disclosed. The wafer holder including a boat holding a plurality of wafers and a reaction gas supply part supplying a reaction gas from a side surface of the plurality of wafers held by the boat, and the wafer holder fu... | 03/22/2012 |
| 20120052657 | METHOD OF FORMING FILM AND SUBSTRATE PROCESSING APPARATUS A method of forming a film and a substrate processing apparatus, which can increase the number of substrates to be processed at once in order to improve productivity, are provided. In order to solve the problems, the method of forming a film includes loading a plurality... | 03/01/2012 |
| 20120052203 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING SUBSTRATE Provided is a substrate processing apparatus and a substrate processing method, capable of preventing a reactive product from being deposited to the inside of a processing chamber and an exhaust line, and preventing the corrosion caused by hydrogen chloride gas. The met... | 03/01/2012 |
| 20120051873 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE A substrate processing apparatus includes a substrate container holding shelf comprising a plurality of shelf boards configured to hold substrate containers thereon; a substrate container carrying mechanism configured to load and unload the substrate containers into/fro... | 03/01/2012 |
| 20120045903 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE, AND SUBSTRATE PROCESSING APPARATUS Provided is a method of forming a tantalum oxide-based film having good step coverage while controlling an oxygen concentration in the film. The method includes forming a tantalum nitride layer on a substrate by supplying a source gas including a tantalum and a nitridin... | 02/23/2012 |
| 20120034570 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE A substrate processing apparatus reduces over-heating of a substrate transfer robot and suppresses deterioration of reliability or lifespan of the substrate transfer robot. The substrate processing apparatus includes a transfer chamber having a substrate transferred the... | 02/09/2012 |
| 20120026030 | MULTI-FUNCTION RADAR DEVICE Provided is a multi-function radar apparatus capable of measuring both a distance to a target object and a temperature of the target object with high accuracy. A transmission signal produced from a high-frequency signal generating unit (9) is amplified by a trans... | 02/02/2012 |
| 20110281226 | HEATER SUPPORTING DEVICE A heater supporting device for use in a semiconductor manufacturing apparatus is provided so as to improve the uniformity of a temperature property and the expected lifespan by preventing support pieces from being damaged and separated from piece holders, and preventing... | 11/17/2011 |
| 20110271907 | Device for processing a substrate, method of processing a substrate and method of manufacturing semiconductor device Provided is a substrate processing apparatus and a method of manufacturing a semiconductor device, which are hard to cause a defect in processing a substrate owing to that a pressure inside a process chamber is not kept constant, and which enable a better processing of ... | 11/10/2011 |
| 20110261243 | SOLID IMAGING APPARATUS In an imaging apparatus which subjects signal electric charges of photodiodes of IT-CCD for interlaced scanning of 1080 effective scanning lines to vertical pixel addition to be read out as image signals, at least one of vertical transfer at the last horizontal period a... | 10/27/2011 |
| 20110261234 | Image pickup system, image pickup apparatus and sensitivity control method An image pickup system includes a plurality of electron multiplication image pickup apparatuses; and a correction coefficient calculating device. The correction coefficient calculating device measures electron multiplication properties of image signals output from the e... | 10/27/2011 |
| 20110259370 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF CLEANING PROCESSING VESSEL When a dry cleaning process is performed in a processing chamber by adding nitrogen monoxide (NO) gas to a cleaning gas, the handling is facilitated, and cleaning performance is improved. A substrate processing apparatus includes a processing vessel configured to proces... | 10/27/2011 |
| 20120010743 | STATISTICAL ANALYSIS METHOD AND SUBSTRATE PROCESS SYSTEM A data analyzing method includes receiving monitor data from the substrate processing apparatus; producing representative value data based on the monitor data; associating apparatus condition information indicating a condition of the substrate processing apparatus at th... | 01/12/2012 |
| 20120009764 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS A method of manufacturing a semiconductor device includes conveying a first substrate provided with an opposing surface having insulator regions and a semiconductor region exposed between the insulator regions and a second substrate provided with an insulator surface ex... | 01/12/2012 |
| 20120006506 | SUBSTRATE PROCESSING APPARATUS AND HEATING EQUIPMENT A substrate processing apparatus includes a heating part including a cylindrical-shaped heat insulator and a heating wire arranged on the inner circumferential surface of the heat insulator, a heat-insulating part configured to define a cylindrical space between the hea... | 01/12/2012 |
| 20120006268 | SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE A CVD device has a reaction furnace (39) for processing a wafer (1); a seal cap (20) for sealing the reaction furnace (39) hermetically; an isolation flange (42) opposite to the seal cap (20); a small chamber (43) formed ... | 01/12/2012 |
| 20110318940 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE, AND SUBSTRATE PROCESSING APPARATUS A method of manufacturing a semiconductor device includes forming a layer containing a predetermined element on a substrate by supplying a source gas containing the predetermined element into a process vessel and exhausting the source gas from the process vessel to caus... | 12/29/2011 |
| 20110318937 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE, METHOD OF CLEANING A PROCESS VESSEL, AND SUBSTRATE PROCESSING APPARATUS A method of manufacturing a semiconductor device includes supplying a process gas into a process vessel accommodating a substrate to form a thin film on the substrate and supplying a cleaning gas into the process vessel to clean an inside of the process vessel, after th... | 12/29/2011 |
| 20110318489 | SUBSTRATE PROCESSING APPARATUS, PROCESSING TUBE, SUBSTRATE HOLDER, FIXING PART OF THE SUBSTRATE HOLDER, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD There is provided a substrate processing apparatus, including: a substrate holder that holds a plurality of substrates (wafers) in a state of being arranged in a lateral direction (approximately in a horizontal direction) approximately in a vertical posture; a processin... | 12/29/2011 |
| 20110311339 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Reduction in cooling rate of a substrate having a lower temperature is suppressed because the substrate having a lower temperature is not affected by radiant heat of a substrate having a higher temperature while cooling a plurality of substrates in a cooling chamber. Th... | 12/22/2011 |
| 20110306212 | SUBSTRATE PROCESSING APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE MANUFACTURING METHOD Embodiments described herein relate to a substrate processing apparatus includes a reaction tube, a processing chamber provided inside the reaction tube to process a substrate therein, an induction target provided inside the reaction tube to surround the processing cham... | 12/15/2011 |
| 20110305543 | SUBSTRATE PROCESSING APPARATUS A substrate processing apparatus includes a holder configured to hold a substrate and carry the substrate into a process chamber, a waiting station located outside the process chamber in which the holder waits prior to carrying the substrate into the process chamber, a ... | 12/15/2011 |
| 20110301739 | CONTROL SYSTEM OF SUBSTRATE PROCESSING APPARATUS, COLLECTING UNIT, SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD OF THE SUBSTRATE PROCESSING APPARATUS There is provided a control system of a substrate processing apparatus, comprising: a collecting unit for collecting data from each component that constitutes a substrate processing apparatus, the collecting unit further comprising at least: a buffer for temporarily sto... | 12/08/2011 |
| 20110300695 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS A method of manufacturing a semiconductor device includes the steps of loading a substrate into a processing chamber; processing the substrate by supplying plural kinds of reaction substances into the processing chamber multiple number of times; and unloading the proces... | 12/08/2011 |
| 20110299538 | APPARATUS FOR PROVIDING CONNECTION BETWEEN NETWORKS When an internal terminal (TM1 to TMn) replaced with another terminal due to the breakdown or the model upgrading and the DHCP function allocates a new private address for the MAC address of the terminal after replacement, the newly allocated private address is m... | 12/08/2011 |
| 20110294280 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS Provided are a method of manufacturing a semiconductor device and a substrate processing apparatus capable of improving defects of conventional CVD and ALD methods, satisfying requirements of film-thinning, and realizing high film-forming rate. The method includes formi... | 12/01/2011 |
| 20110286819 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD A substrate processing apparatus includes a reactor; at least two boat conveying devices configured to convey at least two boats; at least one boat support table configured to support the at least two boats, the boat support table being movable to a position below the r... | 11/24/2011 |
| 20110256733 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS An insulating film having features such as a low dielectric constant, a low etching rate and a high insulating property is formed. An oxycarbonitride film having a predetermined thickness is formed on a substrate in a process vessel by performing a cycle a predetermined... | 10/20/2011 |
| 20110253049 | Semiconductor processing apparatus There is provided a semiconductor processing apparatus comprising a processing tube for housing a substrate support member that supports a plurality of substrates stacked at a prescribed pitch in a vertical direction; a gas supply part that extends in a direction in whi... | 10/20/2011 |
| 20110234100 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE A processing speed may be easily controlled over the wide range within the impedance variation range. A substrate processing apparatus includes: a processing chamber configured to process a substrate; a substrate support unit configured to support the substrate in the p... | 09/29/2011 |
| 20110233198 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD A substrate processing apparatus and a substrate processing method capable of supplying uniform electromagnetic wave power and performing uniform heating are provided. The substrate processing apparatus includes a process chamber for processing a wafer, a boat installed... | 09/29/2011 |
