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Method and apparatus for making a drink hop along a bar or counter
A method for generating a drink which appears to hop from a remote spot on the bar or counter and take one or more leaps, before landing in a patron's glass.
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| Application No. | Application Title | Issue Date |
| 20120129098 | METHOD OF PREPARING A SUBSTRATE FOR LITHOGRAPHY, A SUBSTRATE, A DEVICE MANUFACTURING METHOD, A SEALING COATING APPLICATOR AND A SEALING COATING MEASUREMENT APPARATUS A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of t... | 05/24/2012 |
| 20120127452 | METHOD FOR COARSE WAFER ALIGNMENT IN A LITHOGRAPHIC APPARATUS A method for alignment of a substrate, in which the substrate includes a mark in a scribe lane, and the scribe lane extends along a longitudinal direction as a first direction. The mark has a periodic structure in the first direction. The method includes providing an il... | 05/24/2012 |
| 20120127451 | POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS AND A METHOD FOR POSITIONAL CONTROL A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring devic... | 05/24/2012 |
| 20120127449 | Controller, Lithographic Apparatus, Method of Controlling the Position of an Object and Device Manufacturing Method A controller is provided that controls an actuator system having a plurality of actuators arranged to act on an object. The controller uses a gain balancing matrix to convert a first control signal, representing a set of forces desired to be provided to the centre of gr... | 05/24/2012 |
| 20120127441 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.... | 05/24/2012 |
| 20120105989 | MOUNTINGS FOR ROTATION OF ARRAY OF REFLECTIVE ELEMENTS AND LITHOGRAPHIC APPARATUS INCORPORATING SAME An array of reflective elements in which at least one of the reflective elements is mounted on a mounting which comprises a rod at least partially located within a sleeve. A first end of the rod is fixed to a first end of the sleeve and a second end of the rod is moveab... | 05/03/2012 |
| 20120105961 | ZONE PLATE A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radi... | 05/03/2012 |
| 20120105819 | LITHOGRAPHIC APPARATUS FOR TRANSFERRING PATTERN FROM PATTERNING DEVICE ONTO SUBSTRATE, AND DAMPING METHOD A lithographic apparatus includes a support frame which is supported by a base via a vibration isolation system; a projection system arranged to transfer a pattern from a patterning device onto a substrate, wherein the projection system includes a first frame which is s... | 05/03/2012 |
| 20120105817 | LEAF SPRING, STAGE SYSTEM, AND LITHOGRAPHIC APPARATUS A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein the leaf spring has a substantially panel-shaped body, the leaf spring in... | 05/03/2012 |
| 20120081684 | Object Inspection Systems and Methods Disclosed are systems and methods for object inspection, in particular for inspection of reticles used in a lithography process. The method includes interferometrically combining a reference radiation beam with a probe radiation beam, and storing their complex field ima... | 04/05/2012 |
| 20120081683 | Lithographic Apparatus And Detector Apparatus A detector including a layer of scintillation material, a layer of spacer material on the scintillation material, and a spectral purity filter layer on the spacer material. A method includes directing EUV radiation through a spectral purity filter layer, directing the E... | 04/05/2012 |
| 20120069309 | FLUID HANDLING STRUCTURE, MODULE FOR AN IMMERSION LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from th... | 03/22/2012 |
| 20120052447 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a seco... | 03/01/2012 |
| 20120050740 | SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an... | 03/01/2012 |
| 20120050709 | STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING AN OBJECT TABLE A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device ... | 03/01/2012 |
| 20120048193 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.... | 03/01/2012 |
| 20120044495 | Inspection Method and Apparatus, and Associated Computer Readable Product A system is configured to measure two separately polarized beams upon diffraction from a substrate in order to determine properties of a grating on a substrate. Linearly polarized light sources are passed via a fixed phase retarder in order to change the phase of one of... | 02/23/2012 |
| 20120044472 | Inspection Method for Lithography A method is used to determine focus of a lithographic apparatus used in a lithographic process on a substrate. The lithographic process is used to form at least two periodic structures on the substrate. Each structure has at least one feature that has an asymmetry betwe... | 02/23/2012 |
| 20120044471 | Lithographic Apparatus and Method A method of projecting a patterned beam onto a substrate using an EUV lithographic apparatus having a projection system including a plurality of mirrors. The method includes the following steps. Using the projection system to project the patterned beam onto the substrat... | 02/23/2012 |
| 20120044470 | Substrate for Use in Metrology, Metrology Method and Device Manufacturing Method A pattern from a patterning device is applied to a substrate. The applied pattern includes device functional areas and metrology target areas. Each metrology target area comprises a plurality of individual grating portions, which are used for diffraction based overlay m... | 02/23/2012 |
| 20120044468 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradient... | 02/23/2012 |
| 20120038929 | Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent a... | 02/16/2012 |
| 20120038910 | Inspection Apparatus and Method Ghost reflections in a catadioptric scatterometer objective are excluded from an angle-resolved spectrum measurement by using a partial pupil for illumination and for the measurement excluding the area of the pupil plane that has been illuminated. Ghost reflections are ... | 02/16/2012 |
| 20120038898 | Lithographic Apparatus and Alignment Method A lithographic apparatus comprising a source collector module including a collector, configured to collect radiation from a radiation source; an illuminator configured to condition the radiation collected by the collector and to provide a radiation beam; and a detector ... | 02/16/2012 |
| 20120033223 | Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method for Determining a Property of a Substrate In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, b... | 02/09/2012 |
| 20120033193 | Inspection Apparatus and Method, Lithographic Apparatus and Lithographic Processing Cell An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiatio... | 02/09/2012 |
| 20120026480 | Image-Compensating Addressable Electrostatic Chuck System An electrostatic chuck including a substrate, a support layer to support an object, an electrode layer comprising an electrode and being disposed between the substrate and the support layer configured to apply an electrostatic attraction force on the object upon energiz... | 02/02/2012 |
| 20120024585 | Electrical Connector, Electrical Connection System and Lithographic Apparatus An electrical connector comprises a high voltage pad and a high voltage plate. When connected to another electrical connector, the two plates, which are at the same voltage as the pads, form a region of high voltage in which the field is low. The pads are positioned in ... | 02/02/2012 |
| 20110281039 | METHOD FOR PREVENTING OR REDUCING CONTAMINATION OF AN IMMERSION TYPE PROJECTION APPARATUS AND AN IMMERSION TYPE LITHOGRAPHIC APPARATUS A method for preventing or reducing contamination of an immersion type projection apparatus is provided. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate.... | 11/17/2011 |
| 20110280703 | APPARATUS AND METHOD FOR CONTACTLESS HANDLING OF AN OBJECT An apparatus configured to handle an object in a contactless manner, the apparatus includes a carrying body having a carrying surface which is configured to be directed towards the object, the carrying surface being provided with a plurality of traction members and a pl... | 11/17/2011 |
| 20120021343 | Process Window Signature Patterns for Lithography Process Control A method for identifying process window signature patterns in a device area of a mask is disclosed. The signature patterns collectively provide a unique response to changes in a set of process condition parameters to the lithography process. The signature patterns enabl... | 01/26/2012 |
| 20110279806 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of th... | 11/17/2011 |
| 20110279804 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD In a single or multiple stage lithography apparatus, a table provides a confining surface to a liquid supply system during, for example, substrate table exchange and/or substrate loading and unloading. In an embodiment, the table has a sensor to make a measurement of th... | 11/17/2011 |
| 20110279800 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.... | 11/17/2011 |
| 20110279796 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the f... | 11/17/2011 |
| 20110279795 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback c... | 11/17/2011 |
| 20120019795 | LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND DEVICE MANUFACTURING METHOD Disclosed is a device manufacturing method and associated apparatus, the method comprising transferring a pattern from a patterning device onto a substrate. The method relates to the alignment of said patterning device and said substrate, and comprises imparting a radia... | 01/26/2012 |
| 20120019794 | Variable Reluctance Device, Stage Apparatus, Lithographic Apparatus and Device Manufacturing Method A variable reluctance device includes first and second magnetic members, a coil, a measurement coil, and a control unit. The first and second magnetic members are displaceable relative to each other to provide a magnetic circuit having a variable reluctance. The coil fo... | 01/26/2012 |
| 20110277859 | FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has, on an undersurface, a liquid supply opening or a plurality of liquid supply openings and a liquid extraction opening or a plurality of liquid extraction openings arra... | 11/17/2011 |
| 20110273695 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between t... | 11/10/2011 |
