US Patent Application 20100048029 - Surface Preparation for Thin Film Growth by Enhanced Nucleation
InventorsUS Classes438/758, COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE427/535, Plasma (e.g., cold plasma, corona, glow discharge, etc.)427/534, Cleaning or removing part of substrate (e.g., etching with plasma, glow discharge, etc.)427/248.1, COATING BY VAPOR, GAS, OR SMOKE427/444, PRETREATMENT, PER SE, OR POST-TREATMENT, PER SE (WITHOUT CLAIMED COATING)257/E21.211Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (EPO)Attorney, Agent or FirmInternational ClassesH01L 21/30H05H 1/00 C23C 16/00 B05D 3/04 Issued Patent Number:7943527Abstract textVarious processes and related systems are provided for making structures on substrate surfaces. Disclosed are methods of making a structure supported by a substrate by providing a substrate having a receiving surface and exposing at least a portion of the receiving surface to output from a remote plasma of an inert gas. The remote plasma has an energy low enough to substantially avoid etching or sputtering of the receiving surface but sufficient to generate a treated receiving surface. The treated surface is contacted with a deposition gas, thereby making the structure supported by the substrate. |
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