US Patent Application 20100021747 - HETEROLEPTIC CYCLOPENTADIENYL TRANSITION METAL PRECURSORS FOR DEPOSITION OF TRANSITION METAL-CONTAINING FILMS
InventorsUS Classes428/450, Next to metal427/248.1, COATING BY VAPOR, GAS, OR SMOKE427/255.28, Coating formed from vaporous or gaseous phase reaction mixture (e.g., chemical vapor deposition, CVD, etc.)427/576Metal, metal alloy, or metal oxide coatingAttorney, Agent or FirmInternational ClassesB32B 15/04C23C 16/18 Abstract textMethods and compositions for depositing a film on one or more substrates include providing a reactor with at least one substrate disposed in the reactor. At least one metal precursor are provided and at least partially deposited onto the substrate to form a metal-containing film. |
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