US Patent Application 20100003532 - BETA-DIKETIMINATE PRECURSORS FOR METAL CONTAINING FILM DEPOSITION
InventorsUS Classes428/457, Of metal427/248.1, COATING BY VAPOR, GAS, OR SMOKE427/255.28, Coating formed from vaporous or gaseous phase reaction mixture (e.g., chemical vapor deposition, CVD, etc.)534/15, RARE EARTH METAL CONTAINING (At. No. 21, 39, 57-60 or 62-71)556/32Nitrogen double bonded directly to carbonAttorney, Agent or FirmInternational ClassesC23C 16/18B32B 15/04 C07F 7/28 C07F 7/00 Abstract textMethods and compositions for depositing a metal containing film on a substrate are disclosed. A reactor, and at least one substrate disposed in the reactor, are provided. A metal containing precursor with at least one β-diketiminate ligand is provided and introduced into the reactor, which is maintained at a temperature of at least 100° C. Metal is deposited onto the substrate through a deposition process to form a thin film on the substrate. |
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