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US Patent Application 20090284727 - Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system

Application 20090284727 Filed on February 5, 2009. Published on November 19, 2009

Inventors

Assignee

US Classes

355/71, Including shutter, diaphragm, polarizer or filter355/67, Illumination systems or details355/77Methods

Attorney, Agent or Firm

Foreign Documents

  • 2008-033390 JP 02/14/2008
  • 2008-187977 JP 07/19/2008
  • 2008-264961 JP 10/14/2008

International Classes

G03B 27/54
G03B 27/72


Abstract text


An illumination optical system is one for illuminating a surface to be illuminated with light from a light source, which has a distribution forming optical system including an optical integrator and forming a pupil intensity distribution on an illumination pupil located behind the optical integrator, and an optical attenuator arranged on a predetermined surface in an optical path behind the optical integrator and having an attenuation characteristic of varying an attenuation rate depending upon an angle of incidence to the predetermined surface.

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