InventorAssigneeUS Classes700/108, Performance monitoring118/663CONTROL MEANS RESPONSIVE TO A RANDOMLY OCCURRING SENSED CONDITIONAttorney, Agent or FirmForeign Documents- 2006-207321 JP 07/31/2006
International Classes G06F 19/00 B05C 11/00
Abstract textA control unit of a substrate processing apparatus controls a process to be performed in a chamber. The process includes a step of performing a preceding first process; a step of performing a subsequent second process after performing the first process; a step of determining whether to perform an inter-process conditioning, for arranging the environment in the chamber, during a period between the end of the first process and the start of the second process, based on information on the first process and information on the second process; and a step of performing the inter-process conditioning prior to the second process when it is determined in the determining step that the inter-process conditioning is to be performed. |