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US Patent Application 20090134790 - POLYCRYSTALLINE SILICON AS AN ELECTRODE FOR A LIGHT EMITTING DIODE & METHOD OF MAKING THE SAME

Application 20090134790 Filed on December 19, 2008. Published on May 28, 2009

Inventors

Assignee

US Classes

313/504, Organic phosphor438/29Including integrally formed optical element (e.g., reflective layer, luminescent material, contoured surface, etc.)

Attorney, Agent or Firm

International Classes

H01L 51/52
H01L 51/56

Issued Patent Number:

7923911


Abstract text


Metal induced polycrystallized silicon is used as the anode in a light emitting device, such as an OLED or AMOLED. The polycrystallized silicon is sufficiently non-absorptive, transparent and made sufficiently conductive for this purpose. A thin film transistor can be formed onto the polycrystallized silicon anode, with the silicon anode acting as the drain of the thin film transistor, thereby simplifying production.

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