US Patent Application 20090035465 - CHEMICAL VAPORIZER FOR MATERIAL DEPOSITION SYSTEMS AND ASSOCIATED METHODS
InventorsAssigneeUS Classes427/255.28, Coating formed from vaporous or gaseous phase reaction mixture (e.g., chemical vapor deposition, CVD, etc.)118/715, GAS OR VAPOR DEPOSITION137/8For producing uniform flowAttorney, Agent or FirmInternational ClassesC23C 16/00B65G 51/00 C23C 16/54 Issued Patent Number:7883745Abstract textSystem and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the vaporized precursor to a reaction chamber in fluid communication with the vaporizer, and shutting down the vaporizer and the reaction chamber after a period of time. The method can also include conducting maintenance of the injector at the vaporizer by using a vapor solvent rinse. |
| ||||||||||||||
