US Patent Application 20080143001 - Conduit system for a lithographic apparatus, lithographic apparatus, pump, and method for substantially reducing vibrations in a conduit system
Inventors
AssigneeUS Classes261/34.1, Liquid261/76, Injector type378/34, Lithography415/38, Plural passages with sequential or reverse fluid control137/8For producing uniform flowAttorney, Agent or FirmInternational ClassesB01F 3/04B01F 5/04 B01F 5/12 B01F 5/14 G21K 5/00 F04D 15/00 F17D 3/00 Issued Patent Number:7843548Abstract textA conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid-gas mixture. In an embodiment, the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet arranged for compression of the liquid or liquid-gas mixture. |
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