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US Patent Application 20080054756 - BIMORPHIC STRUCTURES, SENSOR STRUCTURES FORMED THEREWITH, AND METHODS THEREFOR

Application 20080054756 Filed on August 31, 2007. Published on March 6, 2008

Inventors

Assignee

US Classes

310/307, With heat actuated bimetal element29/622Switch making

Attorney, Agent or Firm

International Classes

H02N 10/00
H01H 11/00

Issued Patent Number:

7495368


Abstract text


A bimorphic structure responsive to changes in an environmental condition, sensor structures incorporating one or more of such bimorphic structures, and a method of forming such bimorphic structures. The sensor structure has an electrically-conductive first contact on a substrate, and a bimorph beam anchored to the substrate so that a portion thereof is suspended above the first contact. The bimorph beam has a multilayer structure that includes first and second layers, with the second layer between the first layer and the substrate. A portion of the first layer projects through an opening in the second layer toward the first contact so as to define an electrically-conductive second contact located on the beam so as to be spaced apart and aligned with the first contact for contact with the first contact when the beam sufficiently deflects toward the substrate.

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