U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

US Patent Application 20060103299 - Polycrystalline silicon as an electrode for a light emitting diode & method of making the same

Application 20060103299 Filed on November 10, 2005. Published on May 18, 2006

Inventors

Assignee

US Classes

313/506, Plural layers313/504Organic phosphor

Attorney, Agent or Firm

International Class

H01L 51/00


Abstract text


Metal induced polycrystallized silicon is used as the anode in a light emitting device, such as an OLED or AMOLED. The polycrystallized silicon is sufficiently non-absorptive, transparent and made sufficiently conductive for this purpose. A thin film transistor can be formed onto the polycrystallized silicon anode, with the silicon anode acting as the drain of the thin film transistor, thereby simplifying production.

PatentsPlus Images
Enhanced PDF formats
loading...
PatentsPlus: add to cart
PatentsPlus: add to cartSearch-enhanced full patent PDF image
$9.95more info
 
Sign InRegister
Username  
Password   
forgot password?