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| Application No. | Application Title | Issue Date |
| 20050000401 | Water craft stabilizing device A device for stabilizing boats and other water craft that is generally blade-shaped and attaches to the body or hull of the boat. The stabilizing device projects generally outwardly and downwardly from the boat and is pivotally connected along the vertical axis at the a... | 01/06/2005 |
| 20050000402 | Rudder with sliding pivoting piston coupling The invention relates to a rudder for sea vessels, consisting of a main rudder and a fin which is coupled thereto by means of a vertical piston (15), restrictively guided by the main rudder and provided with a horizontal piston (11) The vertical piston ( 01/06/2005 | |
| 20050000403 | Process for producing single crystal of compound semiconductor and crystal growing apparatus In a production method for producing a compound semiconductor single crystal by LEC method using a crystal growth apparatus with a double crucible structure, it was made to grow up a crystal by covering the second crucible with a plate-like member having a pass-through ... | 01/06/2005 |
| 20050000404 | High purity silica crucible by electrolytic refining, and its production method and pulling method This invention provides a high purity silica crucible having low impurity concentration in its inner portion, and its production method. The crucible, in which at least each content of Na and Li being contained in the depth of 1 mm from the inside surface is less than 0... | 01/06/2005 |
| 20050000405 | Celebration diamond having dome-shaped crown with pavilion A diamond has a pavilion (22) with a plurality of facets (32) disposed from a girdle (26) to a culet (34). A dome-shaped crown (24) is disposed above the girdle. The dome-shaped crown has a plurality of rows of facets (40, 42) c... | 01/06/2005 |
| 20050000406 | Device and method for producing single crystals by vapor deposition A method and a device to grow from the vapor phase, a single crystal of either SiC, a group III-nitride, or alloys thereof, at a growth rate and for a period of time sufficient to produce a crystal of preferably several centimeters length. The diameter of the growing cr... | 01/06/2005 |
| 20050000407 | Semiconductor laser, semiconductor device and nitride series III-V group compound substrate, as well as manufacturing method thereof A semiconductor laser, a semiconductor device and a nitride series III-V group compound substrate capable of obtaining a crystal growth layer with less fluctuation of the crystallographic axes and capable of improving the device characteristics, as well as a manufacturi... | 01/06/2005 |
| 20050000408 | Process for forming polycrystalline silicon layer by laser crystallization A process for forming a polycrystalline silicon layer includes the following steps. Firstly, at least one seed is formed on a substrate. Then, an amorphous silicon layer is formed on the substrate and overlies the seed. Then, the amorphous silicon layer is irradiated wi... | 01/06/2005 |
| 20050000409 | High yield method for preparing silicon nanocrystal with chemically accessible surfaces Silicon nanocrystals with chemically accessible surfaces are produced in solution in high yield. Silicon tetrahalide such as silicon tetrachloride (SiCl4) can be reduced in organic solvents, such as 1,2-dimethoxyethane(glyme), with soluble reducing agents, su... | 01/06/2005 |
| 20050000410 | Manufacturing method of high resistivity silicon single crystal To suppress a fluctuation in resistivity around a target value to thereby stably manufacture high resistivity silicon single crystals having almost the same resistivity values in a manufacturing method wherein a silicon raw material is molten to manufacture a high resis... | 01/06/2005 |
| 20050000411 | Assembly for crucible used for evaporation of raw materials An assembly for vaporizing raw materials in order to prepare vapor deposited phosphor materials comprises a crucible provided with two plates or covers, wherein one thereof is an outermost plate or cover provided with a perforation pattern, selected from the group consi... | 01/06/2005 |
| 20050000412 | Silicon carbide with high thermal conductivity A chemical vapor deposited, β phase polycrystalline silicon carbide having a high thermal conductivity and reduced stacking faults. The silicon carbide is synthesized under specific conditions using hydrogen gas and methyltrichlorosilane gas as reactants. The thermal c... | 01/06/2005 |
| 20050000413 | Coating apparatus A coating apparatus is described for coating the surface of a center or core of chewing gum with a sugarcoated layer. The apparatus includes a cylindrical fixed tub having a bottom and an inner fixed circumferential wall. A rotating plate is mounted on the bottom of the... | 01/06/2005 |
| 20050000414 | Method and apparatus for applying conductive ink onto semiconductor substrates A method and apparatus for applying contacts to a semiconductor substrate, comprising one or more applicator rolls. Each applicator roll comprises a printing surface which has at least one raised pattern surface. Each raised first pattern surface is positioned such that... | 01/06/2005 |
| 20050000415 | Adhesive transfer roller of an adhesive application device The invention relates to an adhesive transfer roller (1) of an adhesive application device, preferably in a tube extruding machine, to transfer adhesive to a sizing roller, whereby the adhesive transfer roller (1) is mounted with bearings in lever arms ( 01/06/2005 | |
| 20050000416 | Dispensing system and method A dispensing system and method for dispensing material onto a substrate. The dispensing system includes a frame, a support, coupled to the frame, that supports the substrate at a dispensing position in the dispensing system, and a dispensing head, coupled to the frame, ... | 01/06/2005 |
| 20050000417 | Edging/gumming machine for non-circular metal covers intended for containers The machine (4) operates continuously and is a single unit having a prismatic construction and a body with an upper base that incorporates a large rotary platen (1), a number of workstations (5) that are placed in said platen and are provided with d... | 01/06/2005 |
| 20050000418 | Apparatus for the formation of coverings on surfaces of solid bodies in a coating chamber An apparatus for the forming a covering on surfaces of solid bodies in a coating chamber. The covering is homogeneous and has a constant layer thickness on the surface of the solid bodies while being flexible for use of different liquids including solid materials. A liq... | 01/06/2005 |
| 20050000419 | Device for cleaning a powder coating booth and powder coating booth with cleaning device Device for cleaning a powder coating booth and powder coating booth with cleaning device. The device for cleaning a powder coating booth is provided with a first air distribution batten arranged on the floor of the powder coating booth. Also provided is a second air dis... | 01/06/2005 |
| 20050000420 | Die head coating, coating device, and method of manufacturing die head for coating During displacement relative to a substrate 1, a coating die head emits coating liquid out of a slot 12a to a surface of the substrate. The coating die head includes a lip 12b having a lip surface 12b and a side having a ... | 01/06/2005 |
| 20050000421 | Device for wetting cable-ends A device for wetting cable-ends includes a stand supporting a control, a bath-container with a bath, and a conveyor unit for conveying to the cable-end a wetting agent which forms the bath. The conveyor unit has a drive, a pump unit, a conveyor-pipe, and a nozzle with t... | 01/06/2005 |
| 20050000422 | Over-clocking in a microdeposition control system to improve resolution A microdeposition system (20) and method deposits precise amounts of fluid material onto a substrate. A microdeposition head (50) includes a plurality of spaced nozzles that fire droplets having a deposited width when deposited on the substrate. A position... | 01/06/2005 |
| 20050000423 | Film forming device A film-forming apparatus of the invention is a film-forming apparatus that includes: a processing container that defines a chamber, a pedestal arranged in the chamber, on which a substrate to be processed can be placed, a showerhead provided opposite to the pedestal, wh... | 01/06/2005 |
| 20050000424 | Method and system for thermal spraying A thermal spraying method and thermal spraying system of the present invention jets thermal spraying powder supplied from a feeder through a connecting conduit by softening or melting the thermal spraying powder using a thermal spraying machine. By setting the internal ... | 01/06/2005 |
| 20050000425 | Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings A chemical vapor deposition (CVD) system and method for applying an aluminide coating constituted by two or more extrinsic metal components on a jet engine component. The aluminide coating is capable of forming a protective complex oxide upon subsequent heating in an ox... | 01/06/2005 |
| 20050000426 | Methods and apparatus for depositing a thin film on a substrate An apparatus for depositing a thin film includes a reaction chamber, a reaction gas provider to supply a reaction gas and/or inert gas to the reaction chamber, an oxidant provider to supply a first oxidant and a second oxidant to the reaction chamber, and an air drain t... | 01/06/2005 |
| 20050000427 | Gas supplying apparatus for atomic layer deposition A gas supplying apparatus for atomic layer deposition, which generates a source gas by vaporizing a powder source and supplies the source gas into a reaction chamber of an atomic layer deposition apparatus, is provided. The apparatus includes a container containing the ... | 01/06/2005 |
| 20050000428 | Method and apparatus for vaporizing and delivering reactant A reactant supply apparatus comprises a vessel with a gas inlet and a gas outlet. Gas lines are connected to the gas inlet or the gas outlet. A plurality of components are positioned along the gas lines. A first heating device is provided for heating the vessel. Apparat... | 01/06/2005 |
| 20050000429 | Spiral gas flow plasma reactor A plasma reactor and accompanying method for thin film deposition is disclosed, comprising a system of input means and exhaust means that produce an adjustable spiral flow of precursor gas used in creating a spatially stable plasma over large substrate surface areas. Th... | 01/06/2005 |
| 20050000430 | Showerhead assembly and apparatus for manufacturing semiconductor device having the same A showerhead assembly of an apparatus for manufacturing a semiconductor device includes a backing plate having a gas inlet, a showerhead combined with the backing plate at an end portion thereof, wherein the showerhead has a plurality of holes, and a sub heater equipped... | 01/06/2005 |
| 20050000431 | Method of modifying source chemicals in an ALD process The invention concerns a method for modifying a source material used in an ALD process, a method for depositing transition metal nitride thin films by an ALD process and apparatus for use in such process. According to the present invention, transition metal source mater... | 01/06/2005 |
| 20050000432 | Suspended gas distribution manifold for plasma chamber A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by a side wall comprising one or more sheets. The sheets preferably provide flexibility to alleviate stress in the gas distribution plate due to thermal expansion and contract... | 01/06/2005 |
| 20050000433 | Gas supplying apparatus and method of testing the same for clogs A gas supplying apparatus of a system for fabricating semiconductor devices is tested for clogs. The gas supplying apparatus includes a carrier gas supplying device for supplying at least one carrier gas, and a plurality of reactive gas supplying devices connected in pa... | 01/06/2005 |
| 20050000434 | Reactor for producing reactive intermediates for low dielectric constant polymer thin films A reactor for forming a reactive intermediate from a precursor having a general formula of Xm—Ar—(CZ′Z″Y)n is disclosed, wherein X and Y are leaving groups, wherein Ar is an aromatic moiety and wherein the reactive intermediate has at least... | 01/06/2005 |
| 20050000435 | Reactor for producing reactive intermediates for low dielectric constant polymer thin films A reactor for forming a reactive intermediate from a precursor for the deposition of a low dielectric constant polymer film via transport polymerization is disclosed. The reactor includes an inlet for admitting a flow of the precursor into the reactor, an interior for c... | 01/06/2005 |
| 20050000436 | Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor A multi-chamber installation (1) treats objects under vacuum. An evacuation system (5) connected to a plurality of chambers (2, 3, 4). To reduce the complexity of the evacuation process, a forepump (5) has several stages (11, 12, 13). ... | 01/06/2005 |
| 20050000437 | Apparatus and method for fabrication of nanostructures using decoupled heating of constituents In one embodiment, an apparatus for fabricating nanostructure-based devices on workpieces includes: a stage for supporting a workpiece, a radiating-energy source, and a feedstock delivery system. The workpiece has catalyst thereon. The radiating-energy source is configu... | 01/06/2005 |
| 20050000438 | Apparatus and method for fabrication of nanostructures using multiple prongs of radiating energy In one embodiment, an apparatus for fabricating nanostructure-based devices on a workpiece includes: a stage for supporting a workpiece, a radiating-energy source, and a feedstock delivery system. The workpiece has catalyst deposited thereon. The workpiece includes mult... | 01/06/2005 |
| 20050000439 | Chemical vapor deposition apparatus and method Chemical vapor deposition apparatus and method are provided with coating gas distribution and exhaust systems that provide more uniform coating gas temperature and coating gas flow distribution among a plurality of distinct coating zones disposed along the length of a c... | 01/06/2005 |
| 20050000440 | Plasma processing apparatus including a plurality of plasma processing units having reduced variation A plasma processing apparatus comprising a plurality of plasma processing units is provided. Each of the plasma processing units has a matching circuit connected between a radiofrequency generator and a plasma excitation electrode. Among these plasma processing units, a... | 01/06/2005 |
